The application provides a
laser etching device and method, relates to the technical field of
laser processing, and the device comprises a pulse
laser device and a base for carrying a battery. The pulse laser device is used for emitting a plurality of laser sub-beams towards the battery. The surface of the battery has at least one
electrode line preset area. After the plurality of laser sub-beams are emitted, a plurality of focused light spots are formed in the same
electrode line preset area. The plurality of focused light spots are spaced apart from each other. The pulse laser device is used for controlling the plurality of focused light spots to scan the battery along the same
electrode line preset area. The arrangement direction of at least two focused light spots in the plurality of focused light spots is arranged at an
acute angle with the scanning direction of the plurality of focused light spots. When the plurality of focused light spots satisfying the above conditions are used to perform
laser etching on the same electrode line preset area, the spacing between adjacent
etching holes is increased, the
etching width is optimized, the
seed crystal area is increased, the series resistance is reduced, the
fill factor is improved, and the
photoelectric conversion efficiency is improved.