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Preparation method of transparent conductive electrode

A transparent conductive electrode and conductive film technology, which is applied in the direction of cable/conductor manufacturing, conductive layer on the insulating carrier, circuit, etc., can solve the problems of silver nanowire density decrease, affect the optical performance of the product, and the diameter becomes thinner, etc., to achieve increase The number of nudity, the visual difference is small, and the effect of reducing etching marks

Active Publication Date: 2021-02-09
NUOVO FILM SUZHOU CHINA INC
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  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] However, wet etching uses chemical reagents to react with silver nanowires, which may lead to a decrease in the density of silver nanowires in the etched area, a thinner diameter, or a shorter length, resulting in a contrast between the appearance of the etched area and the non-etched area, which affects the optics of the final product. performance

Method used

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Embodiment Construction

[0023] In order to make the object, technical solution and advantages of the present invention clearer, the present invention will be described in detail below in conjunction with specific embodiments.

[0024] The present invention aims to provide a method for preparing a transparent conductive electrode, which includes the following steps: coating silver nanowires on a substrate to form a silver nanowire conductive film; coating a substrate on the silver nanowire conductive film, and the substrate covers or semi- Covering the silver nanowires to form a conductive layer; placing a mask with a through hole above the conductive layer; the conductive layer covered by the mask constitutes a first region; using a pretreatment liquid to pass through the through hole to The externally exposed conductive layer is treated to increase the exposed amount of the silver nanowires on the surface of the substrate, and at the same time convert at least part of the surface of the silver nanowi...

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PUM

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Abstract

The invention provides a method for preparing a transparent conductive electrode, comprising the following steps: coating silver nanowires on a substrate to form a silver nanowire conductive film; coating a matrix on the silver nanowire conductive film, and the matrix covers or half covers The silver nanowire constitutes a conductive layer; a mask plate with a through hole is placed above the conductive layer, and the conductive layer covered by the mask plate constitutes a first region; a pretreatment liquid is used to pass through the through hole outward The exposed conductive layer is treated to increase the exposed amount of the silver nanowires on the surface of the substrate, and at the same time convert at least part of the surface of the silver nanowires into a refractory salt; use an etching solution to treat the conductive layer after the pretreatment agent processing to form the second region. In this method, the conductive layer is treated with a pretreatment solution to increase the number of exposed silver nanowires; at the same time, an insoluble silver salt is formed on the surface of the silver nanowires to reduce the oxidation potential of silver, so as to reduce the etching conditions of the silver nanowires, thereby reducing the subsequent Process etch marks.

Description

technical field [0001] The invention relates to the field of preparation of transparent conductive electrodes, in particular to a preparation method of transparent conductive electrodes. Background technique [0002] Silver nanowire transparent conductive film has flexible characteristics, so it has a wide range of applications in flexible displays, touch sensors, solar cells, wearable devices and other fields. [0003] In the above applications, the conductive layer composed of silver nanowires needs to be patterned and processed. Specifically, it can be processed by dry method, such as laser etching; wet method, such as inkjet printing etchant, silk screen etching paste and etching solution. Among them, wet etching has more advantages in production efficiency than laser etching, especially the yellow photolithography process can be operated through roll-to-roll, which can greatly increase the output. [0004] However, wet etching uses chemical reagents to react with silve...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C23F1/02C23F1/30H01B13/00H01B5/14
CPCC23F1/02C23F1/30H01B5/14H01B13/00
Inventor 孟祥浩顾杨潘克菲高绪彬
Owner NUOVO FILM SUZHOU CHINA INC
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