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54results about How to "Improve photoelectric response" patented technology

Preparation method of titanium dioxide nanotube thin film with visible-light activity

The invention belongs to the technical field of nano titanium dioxide photoelectrochemistry and photocatalysis and particularly relates to a preparation method of a titanium dioxide nanotube thin film with visible-light activity. Raw materials used for preparing the titanium dioxide nanotube thin film comprise a metallic titanium sheet or a Ti thin film and carbon quantum dot solution. A direct-current regulated power supply is used for anode oxidization. A muffle furnace is used for heat treatment. The preparation method of the titanium dioxide nanotube thin film with visible-light activity specifically comprises the following steps of preparing a TiO2 nanotube array on the metallic Ti sheet or the Ti thin film by adopting an anode oxidation method, and after annealing treatment, preparing a TiO2 nanotube composite thin film with visible-light activity modified by carbon quantum dots by directly adopting a dipping assembling method, wherein the modification quantity of the carbon quantum dots is adjusted by controlling dipping time. The preparation method of the titanium dioxide nanotube thin film with visible-light activity has the advantages that the process is simple, any expensive equipment and high-cost or toxic drugs are not used, the principle of energy saving and emission reduction is satisfied and a new concept for the modification and the application of titanium dioxide is developed.
Owner:FUDAN UNIV

Total internal reflection structure-based graphene photoelectric detector and preparation method thereof

The invention discloses a total internal reflection structure-based graphene photoelectric detector and a preparation method thereof. The total internal reflection structure-based graphene photoelectric detector includes a surface electrode, a graphene layer, a glass sheet, refraction rate matching liquid and a prism which are arranged sequentially from top to bottom; and incident light is subjected to total internal reflection at the interface of the glass sheet and the graphene layer through the prism. The preparation method of the total internal reflection structure-based graphene photoelectric detector includes the following steps that: graphene is transferred to clean glass; the electrode surface is manufactured on the graphene layer; and the glass sheet covered with the graphene is attached to the prism through the refraction rate matching liquid. According to the total internal reflection structure-based graphene photoelectric detector and the preparation method thereof of the invention, large-area graphene photoelectric detection can be realized based on interaction of light and the graphene under the total internal reflection structure, and photoelectric response of the graphene in a wide spectral range can be enhanced, and high photoelectric response speed of the graphene is reserved, and the photoelectric response of the detector has obvious polarization dependence on differently polarized light which enters the detector.
Owner:NANKAI UNIV

Photoelectrochemical aptamer sensor and preparation method and application thereof

The invention discloses a photoelectrochemical aptamer sensor and a preparation method and application thereof. The photoelectrochemical aptamer sensor comprises a conductive glass electrode, the surface of the reaction end of the conductive glass electrode is modified with a composite nano material, and an aptamer probe is self-assembled on the surface of the composite nano material; and the composite nano material is a gold nanoparticle modified sulfur hybrid hexagonal boron nitride nanosheet loaded with graphite phase carbon nitride. The preparation method comprises the step of sequentiallyloading the gold nanoparticle-modified graphite-phase carbon nitride-loaded sulfur hybrid hexagonal boron nitride nanosheet and the aptamer probe on the surface of the reaction end of the conductiveglass electrode. The sensor has the advantages of high stability, long service life, strong anti-interference capability, wide detection range, low detection limit and the like, the preparation methodis simple in process, safe, pollution-free and low in cost, and the sensor can be widely used for detecting pollutants in media such as water bodies and organisms, and has the advantages of high utilization rate, wide application range, high application value and the like.
Owner:HUNAN UNIV

Vacancy perovskite material-based solar cell and preparation method thereof

The invention discloses a perovskite solar cell taking vacancy perovskite as a perovskite light absorption layer, and mainly solves the problems of poor toxicity, poor stability and low light absorption coefficient of an existing perovskite light absorption layer. The perovskite solar cell comprises a transparent conductive substrate, an electron transport layer, a perovskite absorption layer, a hole transport layer and a metal electrode from bottom to top. The perovskite light absorption layer adopts a composite material with a chemical formula of A2BXmY6-m composed of cations A, cations B, anions X and anions Y, wherein A is one or more of potassium, rubidium or cesium, B is one or more of molybdenum, tungsten, titanium, zirconium, hafnium, germanium, tin, iridium, platinum, palladium and gold, X and Y are chlorine, bromine or iodine, and m is 1-6. According to the invention, the toxicity of the perovskite light absorption layer is eliminated, the light absorption coefficient is improved, the photoelectric conversion performance and stability are improved, and the perovskite solar cell can be used for photoelectric conversion in the fields of photovoltaic transformer stations, artificial satellites, household solar energy and the like.
Owner:XIDIAN UNIV

Composite-structure dual-absorption layer graphene detector and fabrication process thereof

The invention discloses a composite-structure dual-absorption layer graphene detector and a fabrication process thereof. The detector comprises a silicon dioxide substrate, a graphene nanobelt, a metal electrode, a nanometer grating antenna, a metal quantum dot, a metal film annular belt and a transparent adhesive. A sub-wavelength nanometer grating antenna is used for coupling and conducting a light beam and simultaneously generating plasma resonance so as to improve receiving efficiency and improving photoelectric response, the metal quantum dot is used for simulating surface plasmon polariton and generating surface plasmon resonance to improve photoelectric response, and the metal film annular belt is used for focusing an incident light beam so that incident light energy acts on a detection region in a concentrated way and the photoelectric response is improved. With a front-surface and back-surface detector structure, the front surface and the back surface are used for simultaneously receiving and converting to photocurrents, the receiving area is effectively expanded, and the photoelectric response is further improved; and the corresponding fabrication process is simple to operate and is high in reliability. By the detector, the technical bottleneck of graphene weak photon energy detection is favorably broken through.
Owner:XI AN JIAOTONG UNIV

Tm<3+> single-doped three-photon infrared quantum cutting microcrystalline glass as well as preparation method and application thereof

The invention discloses a Tm<3+> single-doped three-photon infrared quantum cutting microcrystalline glass as well as a preparation method and an application thereof. The microcrystalline glass is formed with LaF3 nanocrystal-containing oxofluorogermanate transparent microcrystalline glass as a matrix and Tm<3+> as activating agent ions, and the composition, in a molar ratio, of the microcrystalline glass is 50GeO2-20Al2O3-15LaF3-15LiF-xTmF3, wherein x is greater than or equal to 0.05 and less than or equal to 1.00. During preparation, GeO2, Al2O3, LaF3, LiF and TmF3 are taken as raw materials, and weighing and proportioning the raw materials according to the nominal composition 50GeO2-20Al2O3-15LaF3-15LiF-xTmF3 in the molar ratio, wherein x is greater than or equal or 0.05 and less than or equal to 1.00, and then taking the method of melt quenching in combination with subsequent heat treatment. The microcrystalline glass is capable of effectively absorbing 455-485nm blue light photons to excite the Tm<3+> ions to the energy state 1G4, and also capable of emitting three infrared photos in succession with 3H4 and 3F4 as intermediate energy states. The quantum efficiency of the Tm<3+> single-doped three-photon infrared quantum cutting microcrystalline glass is calculated within the range from 1.59 to 1.61.
Owner:SOUTH CHINA UNIV OF TECH

Thin-film transistor structure visible blind photodetector and preparation method thereof

The invention discloses a thin film transistor structured visible blind photoelectric detector. The thin film transistor structured visible blind photoelectric detector comprises a thin film transistor, wherein the thin film transistor comprises a gate, a semiconductor channel and a gate dielectric layer, the gate dielectric layer is arranged between the gate and the semiconductor channel, the thin film transistor structured visible blind photoelectric detector also comprises a layer of transparent complementary type semiconductor thin film and a transparent metal oxide thin film, the complementary type semiconductor thin film is arranged at one side, far away from the gate dielectric layer, of the semiconductor channel layer and is suitably used for forming a pn junction with the semiconductor channel layer, and the metal oxide thin film is arranged between the semiconductor channel layer and the complementary type semiconductor thin film. The invention also discloses a fabrication method of the thin film transistor structured visible blind photoelectric detector. The pn junction formed from the complementary type semiconductor thin film and the semiconductor channel layer can generate a built-in electric field to prevent recombination of photo-induced electrons and photo-induced holes, the service lifetime of a photo-induced carrier is prolonged, and the suppression ratio of ultraviolet visible light is increased.
Owner:NINGBO INST OF MATERIALS TECH & ENG CHINESE ACADEMY OF SCI
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