Workpiece driving device for round-disc type accessory one-time full-surface deposition and vapor deposition furnace

Abstract

The invention discloses a workpiece driving device for round-disc type accessory one-time full-surface deposition and a vapor deposition furnace. The workpiece driving device comprises at least one pair of a first rotating disc and a second rotating disc which are matched and support a workpiece and drive the workpiece to rotate around the axis of the workpiece. The first rotating discs and the second rotating discs rotate around axes thereof separately, and change contact positions with the workpieces. The design is ingenious. The first rotating discs and the second rotating discs are matchedand support the workpieces and drive the workpieces to rotate, and therefore it is ensured that during the deposition process, the contact positions between the workpieces and the first rotating discs and the second rotating discs can be changed in real time, the problem that one parts of the workpieces are always blocked and deposition filming can not be formed. Workpiece full-surface depositioncan be achieved by one time deposition. Uniformity of a filming layer obtained by deposition is guaranteed. Application is simple, and film layer quality is high.

Description

technical field [0001] The invention relates to the field of vapor deposition equipment, in particular to a workpiece driving device and a vapor deposition furnace for one-time full-surface deposition of disk parts. Background technique [0002] Chemical Vapor Deposition (CVD) refers to the process of introducing the gaseous or liquid reactant vapor containing the film elements and other gases required for the reaction into the reaction chamber, and a chemical reaction occurs on the surface of the substrate to form a film. [0003] The CVD chemical vapor deposition furnace uses the principle of chemical vapor deposition (Chemical Vapor Deposition) to heat the substances involved in the chemical reaction to a certain process temperature, and under the gravitational force generated by the vacuum pump pumping system, it is led to the deposition chamber for reaction and deposition. , to generate a new solid thin film substance. [0004] as attached figure 1 The chemical vapor ...

AI Technical Summary

Problems solved by technology

[0006] However, these structures are not suitable for disc-like workpieces that require full-surface deposition, mainly because: during the deposition process, there are more or less certain contact areas between the substrate holder or the hanger and the disc-like parts, and these The covered areas can never be deposited into a film. If these areas are to be deposited into a film, the deposition process must be stopped, and the position of the workpiece on the hanger or fixture must be adjusted so that the covered part of the workpiece is exposed, and then deposited. Realize one-time full surface deposition, cumbersome operation

[0007] Moreover, even after adjusting the position of the workpiece on the substrate holder or hanger, other areas will be blocked when the deposition continues, which will cause differences in the thickness of the film layer between the blocked area and the non-shielded area, resulting in the final deposition. The film still has the problem of unevenness, which affects the quality of the film

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