Acrylate Compound, Photocurable Composition Comprising the Same, photocurable film and image display device
An acrylate and light-curable technology, which is applied in the field of invention, can solve problems such as increased viscosity, difficult-to-cure structures, and low double bond concentration, and achieve the effects of inhibiting oxygen inhibition, sufficient processability, and promoting chain transfer
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Synthetic example 1
[0104] Synthesis Example 1: Production of Tris(acryloyloxyethyl)amine (Acrylate A)
[0105] After connecting the dropping funnel and the condenser tube to a 1L round bottom flask, the atmosphere was replaced with nitrogen, and 200 mL of tetrahydrofuran was injected, and 25.0 g (0.17 mol) of tris(hydroxyethanol)amine (manufactured by TCI) and 2,6-dimethyl After dissolving 71.8 g (0.67 mol) of pyridine (manufactured by Sigma-Aldrich), it was cooled to -5°C. A solution obtained by dissolving 50.0 g (0.55 mol) of acryloyl chloride (manufactured by TCI) in 150 mL of tetrahydrofuran was put into a dropping funnel, and slowly added dropwise over 2 hours while preventing a sharp rise in temperature. After the dropwise addition, the temperature was raised to At room temperature and stirred for 1 hour. Then, the reactant was heated at 65° C. and further stirred for 6 hours under the reflux condition of tetrahydrofuran. After the reaction was completed, the reactant was cooled to -5°C ...
manufacture example 1
[0110] Production Example 1: Production of Photocurable Composition
[0111] Using the composition of the following Table 1, the photocurable resin compositions of Examples 1-4 and Comparative Examples 1-5 were manufactured, respectively. The unit in Table 1 below is % by weight.
[0112] [Table 1]
[0113]
[0114] a: trifunctional acrylate compound represented by chemical formula 2
[0115] a-1: Isobornyl acrylate (IB: manufactured by Shin-Nakamura Chemical Industry Co., Ltd.) [chemical formula 3]
[0116] a-2: 1,6-hexanediol diacrylate (A-HD-N: manufactured by Shin-Nakamura Chemical Industry Co., Ltd.) [chemical formula 4]
[0117] a-3: Ethoxylated trimethylolpropane triacrylate (A-TMPT-3EO: manufactured by Shin-Nakamura Chemical Industry Co., Ltd.) [chemical formula 5]
[0118] a-4: Ethoxylated glycerin triacrylate (A-GLY-3EO: manufactured by Shin-Nakamura Chemical Industry Co., Ltd.) [chemical formula 6]
[0119] a-5: Trimethylolpropane triacrylate (A-TMPT: manufa...
manufacture example 2
[0134] Production example 2: Production of cured film
[0135] in the Silicon Nitride (Silicon Nitride) was deposited on a glass substrate (Eagle 2000; manufactured by Corning Incorporated) with a size of 50 mm × 50 mm to a thickness of 100 Å. Coating was performed so as to have a thickness of 3.0 μm. After spin coating (Spin Coating), place it on the platform for 5 minutes, put it in an acrylic box, and replace it with a nitrogen atmosphere. cm 2 (UV-A area measurement) It irradiated for 20 seconds, and obtained the cured coating film.
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