944 results about "TM compound" patented technology

An organic phosphate compound having at least one radically polymerizable double bond, at least one phosphate residue having one or two hydroxyl groups, and at least one hydrocarbon group having 4 or more carbon atoms in a molecule, wherein a 10% by weight methanol solution of the organic phosphate compound has an electric conductivity at 25° C. of 0.5 mS/cm or less, and/or the organic phosphate compound has a light transmittance at 455 nm of 90% or more; a process for preparing the organic phosphate compound; a dental polymerizable composition comprising (a) the organic phosphate compound and (b) a polymerizable monomer capable of copolymerizing with the organic phosphate compound.

A radiation curable inkjet fluid includes a radiation curable composition including at least 25 wt % of a vinylether acrylate and at least 15 wt % of a polymerizable compound including at least three acrylate groups, each wt % being based upon the total weight of the radiation curable composition; and a photoinitiator including a tertiary amine group and 0 to 3 wt % of isopropylthioxanthone based upon the total weight of the radiation curable inkjet fluid. Also, an inkjet printing method using the radiation curable inkjet fluid.

A method for simultaneous deposition of multiple compounds on a substrate is provided. In one aspect, a gas stream is introduced into a processing chamber and flows across a substrate surface disposed therein. The gas stream includes at least one dose of a first compound and at least one dose of a second compound. The doses of the first and second compounds are separated by a time delay, and the at least one dose of the first compound and the at least one dose of the second compound are simultaneously in fluid communication with the substrate surface.

The invention provides a method for extracting lithium salts in lithium-containing brine through an extraction method. Lithium is extracted through a co-extraction agent, an extraction agent and a diluent, wherein the extract is a mixture of an amide compound and a neutral phosphorus oxide compound, the structural formula of the amide compound is shown in the specification, and the structural formula of the neutral phosphorus oxide compound is shown in the specification. The method provided by the invention further optimizes the properties of extracted lithium, so that the method is more applicable to industrial application.

The relative intensity of fluorescent light of a melt-polycondensed aromatic polycarbonate produced by the transesterification process (melt polymerization process) of an aromatic dihydroxy compound and a carbonic acid diester in the presence of a catalyst comprising a basic nitrogen compound and/or a basic phosphorus compound in combination with an alkali metal compound is suppressed to 4.0x10-3 or below at a wavelength of 465 nm based on a standard substance in a fluorescent light spectrum obtained by the excitation wavelength of 320 nm. An aromatic polycarbonate having good color stability, especially good stability to the deterioration of the chip color during storage of the chip in air at room temperature can be produced by the present invention.

The present invention discloses the preparation process of CdSe/CdS, CdSe/ZnS and other II-VI type core-shell quantum dot. The CdSe/CdS and CdSe/ZnS core-shell quantum dot are prepared with cadmium acetate, zinc acetate or other inorganic compound, instead of Cd(CH3)2, Zn(CH3)2 or other inflammable, detonable and expensive organic metal compound, as material. The prdouct has excellent single dispersivity, improved fluorescent property, high quantum yield, high stability, and may be used widely as the fluorescent mark for biological detection and analysis.

Provided are a carbon fiber reinforced composite material which exhibits excellent flame retardance, fast curing properties, heat resistance, and mechanical characteristics. Also provided are an epoxy resin composition suitable for use in producing said carbon fiber reinforced composite material as well as a prepreg and housing for electronic/electrical components. The epoxy resin composition is characterized by comprising: [A] an epoxy resin containing at least 50 mass % of a compound as represented by general formula (I), [B] an organic nitrogen compound based curing agent, [C] a phosphoric acid ester, and [D] a phosphazene compound. In general formula (I), R₁, R₂, and R₃ are either a hydrogen atom or a methyl group, and n is an integer of 1 or higher.

The present invention is related to the field of semiconductor processing equipment and methods and provides, in particular, methods and equipment for the sustained, high-volume production of Group III-V compound semiconductor material suitable for fabrication of optic and electronic components, for use as substrates for epitaxial deposition, for wafers and so forth. In preferred embodiments, these methods are optimized for producing Group III-N (nitrogen) compound semiconductor wafers and specifically for producing GaN wafers. Specifically, the method includes reacting an amount of a gaseous Group III precursor as one reactant with an amount of a gaseous Group V component as another reactant in a reaction chamber under conditions sufficient to provide sustained high volume manufacture of the semiconductor material on one or more substrates, with the gaseous Group III precursor continuously provided at a mass flow of 50 g Group III element/hour for at least 48 hours. A system for conducting the method is also provided.

The invention provides a method for extracting lithium salt from lithium-contained brine by using an extraction process. The method comprises the step of extracting lithium by using a co-extraction agent, an extraction agent and a diluent, wherein the extraction agent is a mixture of an amide compound and a neutral phosphorus oxide compound, the amide compound has the structural formula shown in the specification, and the neutral phosphorus oxide compound has the structural formula shown in the specification. The method provided by the invention is used for further optimizing the performance of the extracted lithium and is more suitable for industrial application.

The invention relates to cracking catalyst, containing rare earth ultrastable Y-type zeolite and stroma, wherein the stroma contains alumina with additive; the alumina with additive contains the following composition in percentage by weight: 60 to 99.5 percent of alumina and 0.5 to 40 percent of additive; the additive is selected from one or a plurality of compounds containing alkaline earth, lanthanide metal, silicon, gallium, boron or phosphorus elements; the rare earth ultrastable Y-type zeolite is obtained through a method comprising the following steps that: ultrastable Y-type zeolite and an acid solution with the equivalent concentration between 0.01 and 2 N are mixed with the liquid/solid weight ratio of 4 to 20 in the temperature range between 20 and 100 DEG C, stirred for 10 to 300 minutes, washed and filtered; rare earth salt solution is added in to exchange rare earth ions; the solution is washed and filtered after exchange. The catalyst is strong in heavy oil cracking capability, high in light oil yield and low in coke yield.

The present invention relates to a composition for a thermosetting silicone resin, the composition including: (A) an organohydrogenpolysiloxane; (B) an alkenyl group-containing epoxy compound; (C) an alkenyl group-containing cyclic siloxane; and (D) a hydrosilylation catalyst, a thermosetting silicone resin composition obtained by reacting the composition and a production method thereof, a photosemiconductor element-encapsulating material including the thermosetting silicone resin composition, and a photosemiconductor device including a photosemiconductor element encapsulated with the resin composition or the photosemiconductor element-encapsulating material.

A composite composition includes at least one organic polymer compound having biodegradability, vegetable fibers, and a hydrolysis inhibitor for the organic polymer compound having biodegradability.

A compound that includes at least Si, N and C in any combination, such as compounds of formula (R—NH)_4-nSiX_n wherein R is an alkyl group (which may be the same or different), n is 1, 2 or 3, and X is H or halogen (such as, e.g., bis-tertiary butyl amino silane (BTBAS)), may be mixed with silane or a silane derivative to produce a film. A polysilicon silicon film may be grown by mixing silane (SiH₄) or a silane derviative and a compound including Si, N and C, such as BTBAS. Films controllably doped with carbon and/or nitrogen (such as layered films) may be grown by varying the reagents and conditions.

The invention discloses constitutional repeating units of an organic polysiloxane containing multiple functional groups, which is shown as right formula: in the formula, a, b and c are respectively the molar fractions of corresponding constitutional repeating units, wherein, 0<a<1, 0<b<1, 0<c<1 and p=1 to 200. The invention further discloses the preparation of the organic polysiloxane containing multiple functional groups. The organic polysiloxane containing multiple functional groups provided by the invention not only adds a new variety for organic polysiloxane compounds, but also provides anew choice for the occasion that organic polysiloxane additive-type flame retardant is utilized. In the invention, when the new structural organic polysiloxane containing multiple functional groups isprepared by the method, the selected raw material monomers are all environment-friendly and non-toxic, corrosive gas and toxic wastewater are not produced in the reaction process, thereby not only avoiding adverse impacts on the environment, but also avoiding a series of problems resulting in cost increasing, which are brought by later-stage wastewater treatment.

The present invention relates to an aliphatic polyester resin composition having excellent hydrolysis resistance, added to an aliphatic polyester resin (A), a reactive monomer (B) (e.g. a monocarbodiimide compound) and a reactive polymer (C) (e.g. a polycarbodiimide compound).

A chemically amplified positive resist composition contains (A) an organic solvent, (B) a base resin in the form of a polymer having at least one acid labile group and crosslinked within a molecule and/or between molecules with a crosslinking group having a C-O-C linkage, the polymer having a weight average molecular weight of 1,000-500,000, (C) a photoacid generator, (D) a basic compound, and (E) an aromatic compound having a group 3BOND C-COOH in a molecule. The composition has a high alkali dissolution contrast, high sensitivity and high resolution.

The present invention relates to a composition for optical materials, comprising (a) a compound having in one molecule at least one structure represented by the following Formula 1: wherein R<1 >is a C0-10 hydrocarbon group, each of R<2>, R<3 >and R<4 >is a C1-10 hydrocarbon group or hydrogen, Y is O, S, Se or Te, m is 1 to 5, and n is 0 to 5; (b) a compound having in one molecule at least one isocyanate group and/or at least one isothiocyanate group; (c) a compound having in one molecule at least one mercapto group; and (d) an inorganic compound having sulfur atom and/or selenium atom, and also relates to an optical material produced by polymerization curing the composition, a production method thereof, and an optical lens comprising the optical material. The present invention provides a high refractive, high Abbe's number optical material having an improved impact resistance.

The invention provides a composition for forming a silicon-containing resist underlayer film comprising: (A) a silicon-containing compound obtained by a hydrolysis-condensation reaction of a mixture containing, at least, one or more hydrolysable silicon compound shown by the following general formula (1) and one or more hydrolysable compound shown by the following general formula (2), and (B) a silicon-containing compound obtained by a hydrolysis-condensation reaction of a mixture containing, at least, one or more hydrolysable silicon compound shown by the following general formula (3) and one or more hydrolysable silicon compound shown by the following general formula (4). There can be provided a composition for forming a resist underlayer film applicable not only to a resist pattern obtained in a negative development but also to a resist pattern obtained in a conventional positive development, and a patterning process using this composition.

R¹_m1R²_m2R³_m3Si(OR)_(4-m1-m2-m3)  (1)

U(OR⁴)_m4(OR⁵)_m5  (2)

R⁶_m6R⁷_m7R⁸_m8Si(OR⁹)_(4-m6-m7-m8)  (3)

Si(OR¹⁰)₄  (4)

The present invention relates to novel, soluble, multi-ligand-substituted metal oxide compounds to form metal oxide films with improved stability as well as compositions made from them and methods of their use.

Specifically, the invention pertains to a compounds having the following structure (I):

wherein M is a metal and n is 1 to 20, and wherein at least one of R₁, R₂, R₃, and R₄ is i) and at least at least one of R₁, R₂, R₃, and R₄ is ii), where i) is a silicon bearing organic moiety having at least 2 carbons, and ii) is an organic moiety.

The invention also relates to spin-coatable composition of compounds of structure (I) dissolved into a solvent. The present invention further relates to processes using this spin coatable composition to form a coating on a patterned substrate.