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Semiconductor chip

A semiconductor and chip technology, applied in the direction of semiconductor devices, semiconductor/solid-state device manufacturing, transistors, etc., can solve the problems of increased cut-off current and power consumption, and achieve the effects of improving regularity, suppressing manufacturing deviation, and improving yield

Active Publication Date: 2019-04-02
SOCIONEXT INC
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, in recent years, there has been a problem that excessive scaling down causes significant increases in off-current and power consumption

Method used

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  • Semiconductor chip
  • Semiconductor chip
  • Semiconductor chip

Examples

Experimental program
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Embodiment Construction

[0025] Embodiments will be described below with reference to the drawings. In the following embodiments, the semiconductor chip includes a plurality of standard cells, and at least some of the standard cells in the plurality of standard cells include nanowire FETs (Field Effect Transistors).

[0026] Figure 7 It is a schematic diagram showing an example of a basic structure of a nanowire FET (also referred to as a gate-all-around (GAA: Gate All Around) FET). The nanowire FET is a FET using thin wires (nanowires) through which electric current flows. Nanowires are formed, for example, from silicon. Such as Figure 7 As shown, the nanowire extends horizontally on the substrate, that is, extends parallel to the substrate, and its two ends are connected to structures that become the source region and the drain region of the nanowire FET. In the specification of the present application, the structure connected to both ends of the nanowire in the nanowire FET and used as the so...

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PUM

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Abstract

Provided is a semiconductor chip, using a nano wire FET, that has a layout configuration effective in facilitating easy manufacturing. A semiconductor chip (1) is provided with: a first block (100) that includes a standard cell (110) having a nano wire FET; and a second block (400) that includes a nano wire FET. On the first and second blocks (100, 400), the arrangement pitch, in the Y direction,of nano wires (111, 411) extending in the X direction is an integral multiple of a pitch P1, and the arrangement pitch, in the X direction, of pads (112, 412) is an integral multiple of a pitch P2.

Description

technical field [0001] The present disclosure relates to a semiconductor chip including a standard cell using a nanowire FET (Field Effect Transistor, Field Effect Transistor). Background technique [0002] It is known that there is a standard cell method as a method of forming a semiconductor integrated circuit on a semiconductor substrate. The standard cell method refers to the following method, that is, the basic cells with specific logic functions (such as inverters, latches, flip-flops, full adders, etc.) are prepared as standard cells in advance, and then multiple standard cells are arranged On the semiconductor substrate, these standard cells are connected by wiring, which is a way to design an LSI chip. [0003] Transistors, which are the basic components of LSI, have achieved increased integration, reduced operating voltage, and increased operating speed by reducing gate length (scaling, proportional reduction). However, in recent years, there has been a problem t...

Claims

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Application Information

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IPC IPC(8): H01L21/82H01L21/822H01L21/8238H01L27/04H01L27/088H01L27/092H01L29/06
CPCH01L27/088H01L27/092H01L2027/11874H01L29/775H01L27/11807H01L27/0207H01L21/823412H01L21/823475B82Y10/00H01L29/41758H01L29/0673H01L29/78696H01L29/42392H01L21/8238H01L29/06H01L27/1203H01L29/41733
Inventor 新保宏幸
Owner SOCIONEXT INC
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