Bottom electrode patterning organic electroluminescence device capable of realizing separated control and preparation method thereof
A patterned electrode and patterning technology, which is applied in the fields of electrical solid-state devices, semiconductor/solid-state device manufacturing, electrical components, etc., can solve the problems of blurred boundaries of light-emitting patterns and inability to prepare light-emitting patterns, and achieve product yields that remain unchanged. The effect of low preparation cost and simple process
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[0033] The invention provides a method for preparing a discretely controllable bottom electrode patterned organic electroluminescence device, comprising the following steps:
[0034] (1) ITO modular etching is carried out on the ITO conductive glass to obtain a modular ITO layer;
[0035] (2) preparing a metal conductive layer on the modularized ITO layer to obtain a modularized ITO electrode;
[0036] (3) preparing a patterned insulating layer on the modular ITO electrode to obtain a patterned electrode;
[0037] (4) Evaporating an organic layer on the patterned electrode, the organic layer is sequentially a hole injection layer, a hole transport layer, a light emitting layer, an electron transport layer and an electron injection layer from bottom to top;
[0038] (5) Evaporating a metal electrode on the surface of the organic layer to obtain a discretely controllable bottom electrode patterned organic electroluminescent device.
[0039] The invention performs ITO modular e...
Embodiment 1
[0064] 1. Preparation of discretely controllable patterned electrodes
[0065] The first development: development control drive module
[0066] Use the full ITO to draw the control drive module through lithography technology, the specific steps are as follows:
[0067] 1. Spin-coat photoresist (1000rpm, 60s; 200nm) on the cleaned and dried all-ITO (150nm) conductive glass;
[0068] 2. Pre-baking (125°C, 90s);
[0069] 3. Put on the module electrode film board and expose for 90s;
[0070] 4. After soaking in the developer for 60s, rinse with deionized water;
[0071] 5. Post-baking (130°C, 2min);
[0072] 6. Soak in aqua regia to etch the ITO in the exposed area;
[0073] 7. Clean the photoresist with acetone;
[0074] 8. Prepare a metal conductive layer (molybdenum, aluminum, molybdenum, silver, copper, etc.) on the ITO.
[0075] Second development: developing fine pattern modules
[0076] Perform the second development operation on the regionalized ITO obtained in the...
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