Laser annealing method and array substrate
A technology of laser light source and substrate substrate, which is applied in the manufacture of electrical components, electrical solid-state devices, semiconductor/solid-state devices, etc., can solve problems such as large leakage current, and achieve the effect of reducing leakage current.
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[0033] In order to make the object, technical solution and advantages of the present invention clearer, the implementation manner of the present invention will be further described in detail below in conjunction with the accompanying drawings.
[0034] Low temperature polysilicon (English: Low Temperature Poly-silicon; LTPS for short) TFT is a TFT in which a polysilicon active layer is formed by applying laser annealing technology. The array substrate composed of LTPS TFTs can be applied in display panels such as organic light-emitting diode (English: Organic Light-Emitting Diode; abbreviation: OLED) display panels and liquid crystal display panels (English: Liquid Crystal Display; abbreviation: LCD).
[0035] At present, when the amorphous silicon layer is processed into a polysilicon layer by laser annealing technology, the entire amorphous silicon layer is usually scanned by laser to anneal the entire amorphous silicon layer, so that the entire amorphous silicon layer is tra...
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