Mask, grating and manufacturing method thereof

A mask and grating technology, applied in the field of grating and production, can solve the problems of high cost, limited grating accuracy, and difficult light source technology, and achieve the effects of small period, improved resolution, and small area.

Inactive Publication Date: 2019-05-17
BOE TECH GRP CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

To obtain a higher-resolution grating, shorter wavelengths must be used, but the technical difficulty and high cost of short-wavelength light sources limit the further improvement of the resolution of traditional photolithography patterns, and also limit the accuracy of gratings

Method used

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  • Mask, grating and manufacturing method thereof
  • Mask, grating and manufacturing method thereof

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Embodiment Construction

[0037] In order to make the technical problems, technical solutions and advantages to be solved by the embodiments of the present invention clearer, the following will describe in detail with reference to the drawings and specific embodiments.

[0038] With the vigorous development of modern processing technology, the grating manufacturing process is developing towards high precision, low cost, and large output. At present, the following methods are mainly used to process high-precision gratings: traditional photolithography, electron beam direct writing, nanoimprinting, etc. . The most commonly used production method is traditional lithography. The principle is to expose the photoresist through a mask to obtain an exposure pattern with micron resolution. Because the light has a diffraction effect when passing through the mask, traditional lithography The resolution of the pattern is on the order of the exposure wavelength. To obtain a higher-resolution grating, a shorter wav...

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Abstract

The present invention provides a mask, a grating and a manufacturing method thereof, and belongs to the technical field of display. The mask comprises a surface plasmon excitation structure for exciting plasma interference optical wave under ultraviolet light irradiation and a plasma interference optical wave transmission structure for transmitting and shaping the plasma interference optical wave.The thickness of the plasma interference optical wave transmission structure is greater than a threshold. With the mask of the present invention, a high-precision grating can be prepared.

Description

technical field [0001] The invention relates to the field of display technology, in particular to a mask plate, a grating and a manufacturing method. Background technique [0002] With the vigorous development of modern processing technology, the grating manufacturing process is developing towards high precision, low cost, and large output. At present, the following methods are mainly used to process high-precision gratings: traditional photolithography, electron beam direct writing, nanoimprinting, etc. . The most commonly used production method is traditional lithography. The principle is to expose the photoresist through a mask to obtain an exposure pattern with micron resolution. Because the light has a diffraction effect when passing through the mask, traditional lithography The resolution of the pattern is on the order of the exposure wavelength. To obtain a higher-resolution grating, a shorter wavelength must be used, but the technical difficulty and high cost of a ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F1/22G02B5/18G02B5/00
Inventor 李金祥王洋张灿杨军张荡王纯杰
Owner BOE TECH GRP CO LTD
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