Micro-nano wire manufacturing device and micro-nano structure
Patent Information
- Authority / Receiving Office
- CN · China
- Current Assignee / Owner
- XIAN JIAOTONG LIVERPOOL UNIV
- Publication Date
- 2019-05-28
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Abstract
Description
technical field
[0001] The invention relates to a technology in the field of microelectronics, in particular to a micro-nano wire preparation device and a micro-nano structure. Background technique
[0002] Micro-nano patterns or micro-nano wires prepared on specific substrates using liquid-phase nanomaterials have great research prospects in integrated circuits, optical microelectronic devices, biosensors and biodetectors. The performance of devices in these fields is very large. The degree depends on the one-dimensional micro-nano pattern or micro-nano wire. For example, micro-nano patterns or micro-nano wires made of organic materials can improve the balance of electron and hole transfer, thereby improving the performance of integrated circuits and optical microelectronic devices.
[0003] In recent decades, there have been many methods for preparing one-dimensional micro-nano patterns or micro-nano wires, such as photolithography, micro-contact printing, inkjet printing...