The invention relates to a high-precision and high-resolution
solar cell grid line preparation method. According to the method, a direct photoetching technology is adopted, accurate
exposure is carried out on a photosensitive
adhesive layer through a high-precision designed shading
mask, and a patterned opening which is completely consistent with the
layout of a grid line on the surface of a
solar cell is formed. And then, accurately filling conductive
slurry into the opening by using a
coating or ink-jet printing technology, removing redundant
slurry through mechanical scraping or
chemical cleaning, and forming a stable grid
line structure with excellent
conductivity after high-efficiency grid line forming technical treatment such as
drying and
laser irradiation or high-temperature heat treatment. According to the scheme, the detail precision and the resolution ratio of the
electrode grid line are improved, finer pattern preparation is achieved, the accuracy of the size of the grid line is ensured by accurately controlling the thickness of the photosensitive
adhesive layer and the width of the patterning opening, and the overall performance and the
photoelectric conversion efficiency of the
solar cell can be improved. According to the preparation method, the technological process is simplified, and the production efficiency is improved.