78 results about "Carbon nanotube field-effect transistor" patented technology

A self-aligned carbon-nanotube field effect transistor semiconductor device comprises a carbon-nanotube deposited on a substrate, a source and a drain formed at a first end and a second end of the carbon-nanotube, respectively, and a gate formed substantially over a portion of the carbon-nanotube, separated from the carbon-nanotube by a dielectric film.

Carbon nanotube-based devices made by electrolytic deposition and applications thereof are provided. In a preferred embodiment, the present invention provides a device comprising at least one array of active carbon nanotube junctions deposited on at least one microelectronic substrate. In another preferred embodiment, the present invention provides a device comprising a substrate, at least one pair of electrodes disposed on the substrate, wherein one or more pairs of electrodes are connected to a power source, and a bundle of carbon nanotubes disposed between the at least one pair of electrodes wherein the bundle of carbon nanotubes consist essentially of semiconductive carbon nanotubes. In another preferred embodiment, a semiconducting device formed by electrodeposition of carbon nanotubes between two electrodes is provided. The invention also provides preferred methods of forming a semiconductive device by applying a bias voltage to a carbon nanotube rope. The plurality of metallic single-wall carbon nanotubes are removed (e.g., by application of bias voltage) in an amount sufficient to form the semiconducting device. The devices of the invention include, but not limited to, chemical or biological sensors, carbon nanotube field-effect transistors (CNFETs), tunnel junctions, Schottky junctions, and multi-dimensional nanotube arrays.

This invention describes a novel electronic device consisting of one—or more—vertically stacked gate-all-around silicon nanowire field effect transistor (SNWFET) with two independent gate electrodes. One of the two gate electrodes, acting on the central section of the transistor channel, controls on/off behavior of the channel. The second gate, acting on the regions in proximity to the source and the drain of the transistor, defines the polarity of the devices, i.e. p or n type. The electric field of the second gate acts either at the interface of the nanowire-to-source/drain region or anywhere in close proximity to the depleted region of the SiNW body, modulating the bending of the Schottky barriers at the contacts, eventually screening one type of charge carrier to pass through the channel of the transistor. This is achieved by controlling the majority carriers passing through the transistor channel by regulating the Schottky barrier thicknesses at the source and drain contacts.

A method for forming carbon nanotube field effect transistors, arrays of carbon nanotube field effect transistors, and device structures and arrays of device structures formed by the methods. The methods include forming a stacked structure including a gate electrode layer and catalyst pads each coupled electrically with a source/drain contact. The gate electrode layer is divided into multiple gate electrodes and at least one semiconducting carbon nanotube is synthesized by a chemical vapor deposition process on each of the catalyst pads. The completed device structure includes a gate electrode with a sidewall covered by a gate dielectric and at least one semiconducting carbon nanotube adjacent to the sidewall of the gate electrode. Source/drain contacts are electrically coupled with opposite ends of the semiconducting carbon nanotube to complete the device structure. Multiple device structures may be configured either as a memory circuit or as a logic circuit.

This invention relates to field effect transistors having carbon nanotube contacts and to a method of making these field effect transistors. The field effect transistors have better contacts as the source and drains as well as the bridge are made of carbon nanotubes. The fabrication of the proposed embodiment becomes possible by using a fabrication process which involves exposing the structure to two different temperatures.

Inverter circuits and NAND circuits comprising nanotube based FETs and methods of making the same are described. Such circuits can be fabricating using field effect transistors comprising a source, a drain, a channel region, and a gate, wherein the first channel region includes a fabric of semiconducting nanotubes of a given conductivity type. Such FETs can be arranged to provide inverter circuits in either two-dimension or three-dimensional (stacked) layouts. Design equations based upon consideration of the electrical characteristics of the nanotubes are described which permit optimization of circuit design layout based upon constants that are indicative of the current carrying capacity of the nanotube fabrics of different FETs.

Provided are an n-type carbon nanotube field effect transistor (CNT FET) and a method of fabricating the n-type CNT FET. The n-type CNT FET may include a substrate; electrodes formed on the substrate and separated from each other; a CNT forrmed on the substrate and electrically connected to the electrodes; a gate oxide layer formed on the CNT; and a gate electrode formed on the gate oxide layer, wherein the gate oxide layer contains electron donor atoms which donate electrons to the CNT such that the CNT may be n-doped by the electron donor atoms.

A method is provided for forming a self-aligned carbon nanotube (CNT) field effect transistor (FET). According to one feature, a self-aligned source-gate-drain (S-G-D) structure is formed that allows for the shrinking of the gate length to arbitrarily small values, thereby enabling ultra-high performance CNT FETs. In accordance with another feature, an improved design of the gate to possess a ''T''-shape, referred to as the ''T-Gate,'' thereby enabling a reduction in gate resistance and further providing an increased power gain. The self-aligned T-gate CNT FET is formed using simple fabrication steps to ensure a low cost, high yield process.

A field effect transistor includes a substrate and a gate dielectric formed on the substrate. A channel material is formed on the dielectric layer. The channel material includes carbon nanotubes. A patterned resist layer has openings formed therein. Metal contacts are formed on the channel material in the openings in the patterned resist layer and over portions of the patterned resist layer to protect sidewalls of the metal contacts to prevent degradation of the metal contacts.

A process for forming a carbon nanotube field effect transistor (CNTFET) device includes site-specific nanoparticle deposition on a CNTFET that has one or more carbon nanotubes, a source electrode, a drain electrode, and a sacrificial electrode on a substrate with an interposed dielectric layer. The process includes control of PMMA removal and electrodeposition in order to select nanoparticle size and deposition location down to singular nanoparticle deposition. The CNTFET device resulting in ultra-sensitivity for various bio-sensing applications, including detection of glucose at hypoglycemic levels.

Carbon nanotubes (CNTs) and carbon nanotube field effect transistors (CNFETs) have demonstrated extraordinary properties and are widely accepted as the building blocks of next generation VLSI circuits. A CNT crossbar based nano-architecture, includes layers of orthogonal carbon nanotubes with electrically bistable and charge holding molecules at each crossing, forming a dense array of reconfigurable double gate carbon nanotube field effect transistors (RDG-CNFETs) and programmable interconnects, which is addressed via a voltage controlled nanotube addressing circuits on the boundaries.

A multiple, independent top gated field effect transistor having an improved electron injection and reduced gate induced barrier lowering effects, and a method that allows for the destruction of metallic carbon nanotubes positioned between the source and drain of a top multi-gate transistor are provided. The field effect transistor comprises at least one carbon nanotube (14) coupled between the first and second electrodes (16, 18) and a first gate material (24) formed over a portion of the at least one carbon nanotube (14) and spaced apart from the first and second electrodes (16, 18). A dielectric material (32) is conformally coated on the first and second electrodes (16, 18), the at least one carbon nanotube (14), and the first gate material (24). A second gate material (36) is conformally coated on the dielectric material (32). Other exemplary embodiments include one gate (24, 36), three gates (24, 46, 48), and three gates (24, 54, 56; and 24, 66) having the dielectric layer (52, 56; and 62, 64) portioned with different material characteristics.

The invention discloses a three-valued static random access memory cell realized by the utilization of a carbon nanotube field effect transistor. The three-valued static random access memory cell comprises a first CNFET tube, a second CNFET tube, a third CNFET tube, a fourth CNFET tube, a fifth CNFET tube, a sixth CNFET tube, a seventh CNFET tube, a eighth CNFET tube, a ninth CNFET tube, a tenth CNFET tube, a eleventh CNFET tube and a twelfth CNFET tube. The first CNFET tube, the second CNFET tube, the fourth CNFET tube, the fifth CNFET tube, the seventh CNFET tube, the ninth CNFET tube, the tenth CNFET tube and the eleventh CNFET tube are N-type CNFET tubes. The third CNFET tube, the sixth CNFET tube, the eighth CNFET tube and the twelfth CNFET tube are P-type CNFET tubes. The three-valued static random access memory cell has advantages of fast read-write speed, high stability of read data, small wiring area, low power consumption and large memory capacity.

The invention relates to the technology of semi-conductors and provides a manufacture method for an active layer of a carbon nano tube field effect transistor. The manufacture method includes the following steps: dispersing carbon nano tubes in organic solvents, adding high-molecular polymer, stirring at room temperature to enable the high-molecular polymer to fully dissolve in the organic solvents so as to form a mixed system of the carbon nano tubes and the high-molecular polymer, and ejecting the mixed system onto a receiving board at the voltage of 10-100 KV by adopting an electronic spinning device; and enabling the organic solvents to volatilize so as to form the active layer. The method for manufacturing the carbon nano tube field effect transistor has the advantages of being low in cost, small in requirements for the environment and easy in manufacture technology, the obtained organic electronic devices have strong water oxidizing resisting performance, the method for manufacturing the active layer is well simplified, and performance of the active layer is improved simultaneously.

Provided is a carbon nanotube field effect transistor manufacturing method wherein carbon nanotube field effect transistors having excellent stable electric conduction property are manufactured with excellent reproducibility. After arranging carbon nanotubes to be a channel on a substrate, the carbon nanotubes are covered with an insulating protection film. Then, a source electrode and a drain electrode are formed on the insulating protection film. At this time, a contact hole is formed on the protection film, and the carbon nanotubes are connected with the source electrode and the drain electrode. Then, a wiring protection film, a conductive film and a plasma CVD film are sequentially formed on the insulating protection film, the source electrode and the drain electrode. In the field effect transistor thus manufactured, since the carbon nanotubes to be the channel are not contaminated and not damaged, excellent stable electric conductive property is exhibited.

The invention discloses a CNFET (Carbon Nanotube Field Effect Transistor)-based single-edge pulse signal generator. The CNFET-based single-edge pulse signal generator comprises a first CNFET, a second CNFET, a third CNFET, a fourth CNFET, a fifth CNFET, a sixth CNFET and a seventh CNFET, wherein the first CNFET, the third CNFET and the sixth CNFET are P-type CNFETs; the second CNFET, the fourth CNFET, the fifth CNFET and the seventh CNFET are N-type CNFETs; a grid of the first CNFET, a grid of the second CNFET and a source of the third CNFET are connected with a grid of the fourth CNFET; a drain of the first CNFET, a drain of the second CNFET and a grid of the third CNFET are connected with a grid of the fifth CNFET; a drain of the third CNFET, a drain of the fourth CNFET and a grid of the sixth CNFET are connected with a grid of the seventh CNFET; a source of the fourth CNFET is connected with a drain of the fifth CNFET; and a drain of the sixth CNFET is connected with a drain of the seventh CNFET. The CNFET-based single-edge pulse signal generator has the remarkable characteristics of high speed and low power consumption.