A fast-cycle atomic layer deposition device for micro-nanoparticles

Abstract

The invention belongs to the field of coating equipment manufacturing, and discloses rapidly circulating atomic layer deposition equipment for micro-nano particles. The rapidly circulating atomic layer deposition equipment for the micro-nano particles is formed by connecting two linear motion devices and two rotational motion devices end to end, and a sealed oval is formed. The linear motion devices comprise linear vibration motors, first cooling plates, first supporting plates, first heating pieces and material grooves which are sequentially connected from bottom to top in the vertical direction, atomic layer deposition reaction areas are arranged at one ends of the material grooves, and precursor spraying heads are mounted above the atomic layer deposition reaction areas. The rotationalmotion devices comprise rotational vibration motors, second cooling plates, second supporting plates, second heating pieces and rotational motion material grooves which are sequentially connected frombottom to top in the vertical direction. According to the rapidly circulating atomic layer deposition equipment for the micro-nano particles, the particles can circularly move in the material groovesat a stable motion speed, and the thicknesses of surface films of the micro-nano particle are controlled by controlling the times of the micro-nano particle passing through the atomic layer deposition reaction areas.

Description

technical field [0001] The invention belongs to the field of coating equipment manufacturing, and more specifically relates to a rapid cycle atomic layer deposition equipment for micro-nano particles. Background technique [0002] Atomic layer deposition technology is a method of growing thin films on the surface of substrates through gas-phase chemical reactions. In the atomic layer deposition reaction, two or more precursor reactants arrive at the surface of the substrate in a time-isolated or space-isolated manner, and react with chemical groups on the surface of the substrate to grow a thin film. Due to the limited number of chemical groups on the substrate surface, only one precursor reactant will produce saturated adsorption when reaching the substrate surface. This property is called "self-limiting" of the ALD reaction, so in the ALD process Thin films can be grown as monolayers. Thin films grown by atomic layer deposition have the advantages of precisely controllab...

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Problems solved by technology

[0003] However, the current atomic layer deposition technology for micro-nanoparticles still has shortcomings such as limited by vacuum conditions, low production efficiency, and high cost. Further applications in materials

Aiming at this technical problem, the search found that the patent with the publication number CN107099784A discloses a nozzle that uses space-isolated atomic layer deposition technology to grow thin films on flat substrates. Although this method can achieve uniform growth of thin films on flat substrates, but It is not possible to grow a continuous and complete film on the surface of micro-nano particles with a larger specific surface area

The patent with the publication number CN108359960A discloses the combination of vibration motor and space isolation nozzle to grow thin film on the surface of micro-nano particles. The isolation nozzle is in a static state, and the relative distance between the two is constantly changing. The growth of the film on the particle surface is affected by the vibration of the particle conveying trough, and in this patent, the particle surface is multi-layered by increasing the number of nozzles and the length of the trough. The method of film deposition lacks practical operability, and it is impossible to realize the cyclic continuous deposition of micro-nano particles

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