Substrate used for diamond synthesis and having coating layer as well as diamond synthesis system

A coating and diamond technology, applied in the field of diamond synthesis devices, can solve problems such as the surface roughness of the coating, and achieve the effect of improving product quality and achieving batch stability.

Inactive Publication Date: 2019-06-21
CHANGSHA ADVANCED MATERIALS IND RES INST CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0008] Aiming at the problems of diamond fixation and polycrystalline growth in the mass production process of diamonds in the prior art, the present invention proposes a solution for co-growth of multiple diamonds, that is, a substrate for diamond sy

Method used

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  • Substrate used for diamond synthesis and having coating layer as well as diamond synthesis system
  • Substrate used for diamond synthesis and having coating layer as well as diamond synthesis system
  • Substrate used for diamond synthesis and having coating layer as well as diamond synthesis system

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Embodiment 1

[0073] figure 1 It is a structural schematic diagram of a substrate for diamond synthesis with a coating layer in an embodiment of the present invention.

[0074] Such as figure 1 As shown, the substrate for diamond synthesis with a coating layer includes a substrate base 1 , a coating layer 2 ; a first surface 3 not covered by the coating layer, and a coating layer surface 4 .

[0075] The substrate base 1 is located in the reaction chamber 8, and the upper surface of the substrate base is a sample mounting surface. The coating layer 2 covers part of the sample mounting surface.

[0076] Since the working environment of the substrate is as high as 900°C, the coating layer is made of a material that can withstand a high temperature of at least 900°C without detaching from the contact surface and warping. The material of the coating layer is preferably W alloy. At the same time, considering the requirements of the working environment, other metals such as Mo can also be se...

Embodiment 2

[0082] This embodiment provides a diamond synthesis system including the above-mentioned substrate. The system includes a microwave source 6 and a microwave coupling system 7 . The microwave coupling system guides microwaves generated by the microwave source 6 into the reaction chamber 8 . Generally speaking, the microwave coupling system includes components such as waveguide, three-pin, mode converter, and short-circuit piston. Further, a circulator and a water load may be included to protect the microwave generating device and absorb reflected microwaves. The reaction chamber is connected with a reaction chamber of an air inlet system and an air outlet system. The air intake system introduces the reaction gas into the reaction chamber. After the microwave coupling system introduces the microwave into the reaction chamber, the microwave excites the dissociated reaction gas in the reaction chamber to form plasma, and deposits diamond on the seed crystal. The gas outlet syste...

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PUM

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Abstract

The invention provides an underlayment used for diamond synthesis and having a coating layer as well as a diamond synthesis system. The substrate is used to place seed crystals for diamond synthesis and at least comprises one sample mounting surface, a plurality of seed crystal mounting grooves are formed in each sample mounting surface, the roughness of each sample mounting surface is larger thanthat of the bottom surfaces of the seed crystal mounting grooves. aiming at the problems of diamond fixation and polycrystalline growth in diamond mass production in the prior art, a film is uniformly plated on the surface of the substrate to roughen the plating surface, so that purposes of fixation of diamond seed crystals, batch fixation and inhabitation of polycrystalline growth can be achieved. The invention also provides a diamond synthesis system which comprises a microwave source, a microwave coupling system, a reaction chamber with an air inlet system and an air outlet system, a vacuum system connected to the reaction chamber, a substrate located in the reaction chamber, wherein the substrate at least comprises one sample mounting surface, the plurality of seed crystal mounting grooves are formed in the surface of each sample mounting surface, and the roughness of each sample mounting surface is larger than that of the bottom surfaces of the seed crystal mounting grooves.

Description

technical field [0001] The invention relates to the field of diamond synthesis devices, in particular to a diamond synthesis substrate with a coating layer and a diamond synthesis system. Background technique [0002] Diamond has attracted everyone's attention due to its excellent physical and chemical properties. However, natural diamond reserves are limited, so people have developed a variety of synthetic diamond methods, such as high temperature and high pressure (HPHT), hot wire chemical vapor deposition (HJCVD). Among them, the microwave plasma chemical vapor deposition method MPCVD (Microwave plasma chemical vapor deposition) synthetic diamond method has become a more suitable method because it does not introduce impurities and can synthesize high-quality, large-area diamonds. [0003] The quality of diamond synthesized by MPCVD is related to many factors, including carbon source concentration, gas flow rate, temperature, substrate stage height, microwave power, synth...

Claims

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Application Information

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IPC IPC(8): C30B29/04C30B25/18
Inventor 黄翀彭国令
Owner CHANGSHA ADVANCED MATERIALS IND RES INST CO LTD
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