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Quantum-dot film transfer printing method

A technology of quantum dots and thin films, which is applied in the field of transfer printing of quantum dot films, can solve problems such as film residue and transfer pattern defects, etc., and achieve the effect of strong adsorption

Active Publication Date: 2019-06-25
TCL CORPORATION
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] In view of the deficiencies in the prior art above, the purpose of the present invention is to provide a transfer printing method for quantum dot films, aiming to solve the problem that the existing transfer printing methods for quantum dot films tend to cause part of the film to remain, resulting in defective transfer patterns

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0066] Add epoxy resin EPON826 into the flask, heat it to 70 degrees Celsius, and after it is completely melted, add hydroxyl-terminated polydimethylsiloxane, polyoxypropylene diamine epoxy curing agent (JEFFAMINE D-230) and decane into the flask Amine, wherein the molar ratio of epoxy resin, hydroxyl-terminated polydimethylsiloxane, curing agent, and decylamine is 100:5:25:50, stir and mix evenly to obtain a shape-memory polymer, and pour the polymer into In the mold with concave-convex microstructure, it is cured after heating at 100 degrees Celsius for 1.5 hours, and then cured at 130 degrees Celsius for 1 hour, and then the cured shape memory polymer is separated from the mold to obtain the initial stamp with shape memory function , its glass transition temperature is 40-60 degrees Celsius;

[0067] Use a mask to cover the convex part, and then perform oxygen plasma treatment on the concave part of the concave-convex printing surface to increase the surface energy of the c...

Embodiment 2

[0072] Add epoxy resin E20 into the flask, heat it to 90 degrees Celsius, after it is completely melted, stir and vacuumize, dehydrate for 1.5h, add polydimethylsiloxane, diphenylmethane diisocyanate and an appropriate amount as solvent in the flask Toluene, after heating at 80 degrees Celsius for 2h, 1,4-butanediol was added to the flask, wherein epoxy resin, polydimethylsiloxane, diphenylmethane diisocyanate, 1,4-butanediol The molar ratio is 10:1:15:5. After reacting for 0.5h, put the flask into an oven and dry it at 80 degrees Celsius to obtain a shape memory polymer; then pour the shape memory polymer into a mold with a concave-convex microstructure, Heating at 200 degrees Celsius for 1.5 hours and curing, and then separating the cured shape memory polymer from the mold to obtain an initial stamp with shape memory function, the glass transition temperature of which is 60-80 degrees Celsius;

[0073] Use a mask to cover the convex part, and then perform Ar plasma treatment...

Embodiment 3

[0078] Add epoxy resin E20 into the flask, heat it to 90 degrees Celsius, after it is completely melted, stir and vacuumize, dehydrate for 1.5h, add polydimethylsiloxane, diphenylmethane diisocyanate and an appropriate amount as solvent in the flask Toluene, after heating at 80 degrees Celsius for 2h, 1,4-butanediol was added to the flask, wherein epoxy resin, polydimethylsiloxane, diphenylmethane diisocyanate, 1,4-butanediol The molar ratio is 10:1:15:5. After reacting for 0.5h, put the flask into an oven and dry it at 80 degrees Celsius to obtain a shape memory polymer; then pour the shape memory polymer into a mold with a concave-convex microstructure, Heating at 200 degrees Celsius for 1.5 hours and curing, and then separating the cured shape memory polymer from the mold to obtain the initial stamp with shape memory function, the glass transition temperature of which is 60~80 degrees Celsius

[0079] Use a mask to cover the convex part, and then perform UVO treatment on th...

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Abstract

The invention discloses a quantum-dot film transfer printing method. The quantum-dot film transfer printing method comprises the steps that an initial seal is provided, a plurality of initial convex patterns and a plurality of initial concave patterns located between the initial convex patterns are arranged on the seal surface of the initial seal; surface treatment of the initial concave patternsof the initial seal is carried out; the initial seal after being subjected to the surface treatment is subjected to deformation treatment for forming a deformed seal with a flat seal surface; a quantum-dot initial film is prepared on the seal surface of the deformed seal; the deformed seal prepared with the quantum-dot initial film on the seal surface is restored to an initial seal, and the initial seal that the initial convex patterns and the initial convex patterns on the seal surface are provided with the quantum-dot patterned film is formed; and the initial seal with the quantum-dot patterned film on the seal surface makes contact with a target substrate so that the quantum-dot patterned film on the initial convex patterns is subjected to transfer printing on the target substrate. According to the quantum-dot film transfer printing method, the problem that an existing quantum-dot film transfer printing method is prone to causing partial film residues and defective transfer printingpatterns is solved.

Description

technical field [0001] The invention relates to the technical field of transfer printing, in particular to a transfer printing method of a quantum dot film. Background technique [0002] Quantum dots have many advantages such as easy adjustment of luminous color, high color saturation, solution processability, high stability, etc., and are regarded as strong competitors for the next generation of display technology. In the preparation of quantum dot thin films, the spin coating method is the fastest and most convenient processing method with good film quality, but the spin coating method can only be used to prepare monochromatic light-emitting devices, while in the manufacture of full-color light-emitting devices, it is necessary to prepare patterns Quantum dot films. At present, the methods of patterning quantum dots mainly include inkjet printing, transfer printing, etc. The conventional transfer printing process uses a viscoelastic stamp as a transfer carrier, and uses k...

Claims

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Application Information

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IPC IPC(8): B41M5/382B29C69/00
Inventor 张滔向超宇李乐辛征航王雄志
Owner TCL CORPORATION