Preparation method of tubular chromium target material

A chromium target, tubular technology, applied in the field of tubular chromium target preparation, can solve the problems of chromium target density to be further improved, difficult to control straightness, existing process pollution, etc., to prevent bending deformation, combine Tight, pure effect

Active Publication Date: 2019-07-05
无锡飞而康新材料科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0007] Therefore, the technical problem to be solved by the present invention is to overcome the defects in the prior art that cracks are prone to occur in the preparation process of the tubular chromium target, it is difficult to control the straightness, the density of the chromium target needs to be further improved, and the existing process is seriously polluted. , thereby providing a method for preparing a tubular chromium target

Method used

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  • Preparation method of tubular chromium target material
  • Preparation method of tubular chromium target material
  • Preparation method of tubular chromium target material

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0040] This embodiment provides a method for producing a tubular chromium target, such as figure 1 shown, including:

[0041] S1: A layer of NiCr alloy 6 is prepared by plasma spraying on the outer surface of the stainless steel back pipe 6, and the thickness of the alloy is 0.5mm. There is a 5mm long area at the two ends of the back pipe that is not sprayed, so as to facilitate the welding of the upper and lower covers in the next step.

[0042]S2: Stainless steel is used to make the outer casing 3, the upper cover 2, and the lower cover 9. At the same time, a degassing port 1 with an outer diameter of 8mm, an inner diameter of 4mm and a height of 300mm is welded on the upper cover 2 for powder loading and degassing.

[0043] S3: Weld the stainless steel back pipe 6, the outer sheath 3 and the upper and lower covers together to form a metal sheath with a cavity inside.

[0044] S4: fill the cavity inside the metal sheath with chromium powder 4 with a purity of 99.2% through...

Embodiment 2

[0053] This embodiment provides a method for producing a tubular chromium target, such as figure 1 shown, including:

[0054] S1: A layer of NiCr alloy is prepared by plasma spraying on the outer surface of the stainless steel back pipe, and the thickness of the alloy is 1 mm. There is a 5mm long area at the two ends of the back pipe that is not sprayed, so as to facilitate the welding of the upper and lower covers in the next step.

[0055] S2: Low-carbon steel is used as the outer cover and the upper and lower covers. At the same time, a degassing port with an outer diameter of 8mm, an inner diameter of 4mm and a height of 300mm is welded on the upper cover for powder loading and degassing.

[0056] S3: Weld the stainless steel back pipe, the outer sheath and the upper and lower covers together to form a metal sheath with a cavity inside.

[0057] S4: Fill the cavity inside the metal sheath with chromium powder with a purity of 99.5% through the powder loading and degassin...

Embodiment 3

[0066] This embodiment provides a method for producing a tubular chromium target, such as figure 1 shown, including:

[0067] S1: A layer of NiCr alloy is prepared by plasma spraying on the outer surface of the stainless steel back pipe, and the thickness of the alloy is 1.5mm. There is a 5mm long area at the two ends of the back pipe that is not sprayed, so as to facilitate the welding of the upper and lower covers in the next step.

[0068] S2: Low-carbon steel is used as the outer cover and the upper and lower covers. At the same time, a degassing port with an outer diameter of 8mm, an inner diameter of 4mm and a height of 300mm is welded on the upper cover for powder loading and degassing.

[0069] S3: Weld the stainless steel back pipe, the outer sheath and the upper and lower covers together to form a metal sheath with a cavity inside.

[0070] S4: Fill the cavity inside the metal sheath with chromium powder with a purity of 99.9% through the powder loading and degassi...

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Abstract

The invention belongs to the technical field of target material manufacturing and in particular relates to a preparation method of a tubular chromium target material. The preparation method comprisesthe following steps: preparing a transitional layer; preparing a package sheathing; degassing the package sheathing; carrying out hot isostatic pressuring; carrying out annealing treatment; carrying out machining and the like. The tubular chromium target material prepared by the method is free of cracks and bending deflection and high in purity, the density is greater than 99%, and the percent ofpass of products is increased greatly.

Description

technical field [0001] The invention belongs to the technical field of target material manufacturing, and in particular relates to a method for preparing a tubular chromium target material. Background technique [0002] With the rapid development of thin film science and the continuous progress of thin film technology, people pay more and more attention to the requirement of obtaining corresponding functions through surface treatment. In many thin film processes, physical vapor deposition (PVD) technology is widely used for its simple operation, small material source limitation and environmental friendliness. Among them, magnetron sputtering and arc ion plating technology are physical vapor deposition (PVD) A typical representative of the technology and the most widely used. [0003] The target is the material source that bombards the atoms in the target through magnetron sputtering and multi-arc ion coating system under appropriate process conditions, and then deposits the...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/34B22F3/15B22F3/24
CPCC23C14/3414B22F3/15B22F3/24B22F2003/248
Inventor 刘慧渊
Owner 无锡飞而康新材料科技有限公司
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