Holographic Aberration Absolute Calibration Method and System Based on Shift and Polynomial Fitting
A polynomial fitting and absolute calibration technology, applied in the field of optical measurement, can solve the problems of loss of information, loss of target object information, etc., and achieve the effect of good compensation effect and low requirements for optical path settings
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Embodiment 1
[0059] An absolute calibration method for digital holographic microscope aberration based on sequential shift and Chebyshev polynomial fitting, which can realize system aberration compensation for any traditional digital holographic microscope optical system to obtain a clear and precise phase of the test sample, like figure 2 shown, including the following steps:
[0060] (1) Collect holograms to obtain three holograms including the phase of the test object and the system aberration, that is, after collecting the first hologram, move the sample twice orthogonally on the vertical plane of the optical axis and capture Hologram; system aberrations include oblique aberration caused by the off-axis angle of off-axis holography, and other aberrations introduced by optical elements such as microscopic objective lenses that are not completely consistent with reference light and object light, including: off-axis Focus, spherical aberration, astigmatism and other low-order and high-o...
Embodiment 2
[0085] A realization system of the above-mentioned digital holographic microscope aberration absolute calibration method based on sequential displacement and Chebyshev polynomial fitting includes a three-axis displacement platform on which an object to be measured is located.
[0086] For a standard digital holographic microscope optical path setting, the present invention only needs to add an additional three-axis displacement platform to perform systematic aberration compensation, that is, it can realize compensation for any traditional digital holographic microscope optical system.
Embodiment 3
[0088] A realization system of the above-mentioned digital holographic microscope aberration absolute calibration method based on sequential shift and Chebyshev polynomial fitting, the system also includes sequentially arranged polarized helium-neon laser, first half-wave plate, spatial filter and Polarizing beam-splitting prism, the light is divided into two paths after passing through the polarizing beam-splitting prism, and a second half-wave plate is set on one path, the light passes through the second half-wave plate, is reflected by the second reflector, and then is irradiated on the CCD detector by a non-polarizing beam-splitting prism. The other path is reflected by the first reflector, irradiates on the object to be measured on the three-axis displacement platform, and irradiates on the CCD detector through the first microscopic objective lens and the non-polarizing beam splitter prism.
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