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Holographic Aberration Absolute Calibration Method and System Based on Shift and Polynomial Fitting

A polynomial fitting and absolute calibration technology, applied in the field of optical measurement, can solve the problems of loss of information, loss of target object information, etc., and achieve the effect of good compensation effect and low requirements for optical path settings

Active Publication Date: 2020-11-27
SHANDONG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The calculation functions and algorithms used are different, and the error of the method itself is also different. The application conditions, that is, the types of aberrations that the method can eliminate and the preconditions for the use of the method are also different. Some methods even lose information themselves, such as using The background fitting method requires that the proportion of the background is much larger than that of the test sample, and the method of using filtering to achieve compensation will inevitably lose the information of the target object, etc.

Method used

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  • Holographic Aberration Absolute Calibration Method and System Based on Shift and Polynomial Fitting
  • Holographic Aberration Absolute Calibration Method and System Based on Shift and Polynomial Fitting
  • Holographic Aberration Absolute Calibration Method and System Based on Shift and Polynomial Fitting

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Embodiment 1

[0059] An absolute calibration method for digital holographic microscope aberration based on sequential shift and Chebyshev polynomial fitting, which can realize system aberration compensation for any traditional digital holographic microscope optical system to obtain a clear and precise phase of the test sample, like figure 2 shown, including the following steps:

[0060] (1) Collect holograms to obtain three holograms including the phase of the test object and the system aberration, that is, after collecting the first hologram, move the sample twice orthogonally on the vertical plane of the optical axis and capture Hologram; system aberrations include oblique aberration caused by the off-axis angle of off-axis holography, and other aberrations introduced by optical elements such as microscopic objective lenses that are not completely consistent with reference light and object light, including: off-axis Focus, spherical aberration, astigmatism and other low-order and high-o...

Embodiment 2

[0085] A realization system of the above-mentioned digital holographic microscope aberration absolute calibration method based on sequential displacement and Chebyshev polynomial fitting includes a three-axis displacement platform on which an object to be measured is located.

[0086] For a standard digital holographic microscope optical path setting, the present invention only needs to add an additional three-axis displacement platform to perform systematic aberration compensation, that is, it can realize compensation for any traditional digital holographic microscope optical system.

Embodiment 3

[0088] A realization system of the above-mentioned digital holographic microscope aberration absolute calibration method based on sequential shift and Chebyshev polynomial fitting, the system also includes sequentially arranged polarized helium-neon laser, first half-wave plate, spatial filter and Polarizing beam-splitting prism, the light is divided into two paths after passing through the polarizing beam-splitting prism, and a second half-wave plate is set on one path, the light passes through the second half-wave plate, is reflected by the second reflector, and then is irradiated on the CCD detector by a non-polarizing beam-splitting prism. The other path is reflected by the first reflector, irradiates on the object to be measured on the three-axis displacement platform, and irradiates on the CCD detector through the first microscopic objective lens and the non-polarizing beam splitter prism.

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Abstract

The invention relates to a digital holographic microscope aberration absolute calibration method and system based on sequential shifting and Chebyshev polynomial fitting, and belongs to the field of optical measurement. The method comprises the steps of orthogonally moving a sample twice after a first hologram is collected and separately capturing holograms of the sample, thus acquiring three holograms; performing phase modulation on the holograms to acquire three original phase results; performing coordinate conversion on the results, thus enabling the converted test object to have a coherentphase; performing differential computation to acquire phase differential data of a system aberration phase before and after two displacements; computing a Chebyshev polynomial coefficient and thus computing the system aberration phase; and subtracting the system aberration phase from the acquired original phase results including aberration to acquire the phase of the test object. According to themethod and system provided by the invention, the medium-high frequency information of the object phase can be effectively protected, the requirement on setting of light paths is low, and the system aberration compensation can be performed on the random traditional digital holographic microscope imaging system by only needing an additional triaxial displacement platform.

Description

technical field [0001] The invention relates to a digital holographic microscope aberration absolute calibration method and system based on sequential displacement and Chebyshev polynomial fitting, belonging to the technical field of optical measurement. Background technique [0002] Digital holographic microscopy is a non-destructive, label-free and interferometric quantitative phase-contrast technique that has had a huge impact in many fields such as biology, neuroscience, nanoparticle tracking, microfluidics and metrology. Like other traditional interference systems, the digital holographic microscope system also has system phase distortion, which is mainly introduced by the aberration of the microscope objective lens and other optical components and the system adjustment error. Typically, systematic phase aberrations are superimposed on the sample phase information and need to be compensated for. [0003] Recently, many physical and numerical methods have been proposed ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01B11/00
CPCG01B11/005
Inventor 刘振华何伟林杨忠明刘兆军
Owner SHANDONG UNIV
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