The invention relates to a self-locking type
shutter device with high
impact resistance, which includes an
image sensor support, separation blades, acting arms and driving motors, wherein a photosensitive window is arranged at the middle part of the
image sensor support; the separation blades are provided with sliding grooves, and can be rotationally mounted on the
image sensor support through separation blade shafts, and the separation blades can completely shield the photosensitive window when closed, and are within the range of the image sensor support when opened normally on two sides of the photosensitive window; the acting arms are rotationally mounted on the image sensor support through rotating shafts, and are provided with convex columns which are arranged at one end of each acting arm respectively, pass through the sliding grooves of the separation blades, and can slide along the sliding grooves; the connection lines between the centers of the rotating shafts of the acting arms and the axes of the convex columns are orthogonally intersected with the groove lines of the sliding grooves of the separation blades, or form included angles slight larger than 90 degrees; and the driving motors are mounted on the image sensor support, and are connected with the acting arms for driving the acting arms. The self-locking type
shutter device with high
impact resistance has the characteristics of self-locking, high
impact resistance, high overload resistance and the like in the normally-open state, and capability of realizing non-uniformity correction or
exposure control of an image sensor focal plane in the
closed state, so that the opening and closing time can be regulated and controlled conveniently according to requirements, the volume is small and the structure is compact.