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Method for patterning nanoparticle layer, quantum dot light emitting device and display apparatus

A quantum dot luminescence, nanoparticle technology, applied in nano-optics, chemical instruments and methods, nanotechnology, etc., can solve the problems of high resolution, difficult to achieve, and the impact of quantum dot performance, and achieve high resolution and good performance. Effect

Active Publication Date: 2019-08-16
BOE TECH GRP CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, the production efficiency of QLED has not yet reached the level of mass production. The most important reason is that the high-resolution patterning technology of QLED has not yet achieved a breakthrough.
[0003] Quantum dots are zero-dimensional nano-semiconductor materials. The size of the three dimensions of quantum dots is not greater than twice the exciton Bohr radius of the corresponding semiconductor material. When manufacturing patterned quantum dots in the prior art, due to the Due to the characteristics of inorganic nanoparticles, it is impossible to make patterned quantum dots by evaporation and patterning
[0004] In the prior art, patterned quantum dots are generally produced by inkjet printing, but it is difficult to achieve high resolution with this method
In order to improve the resolution of products in the prior art, photolithography is used to make patterned quantum dots. Since photolithography includes an exposure process, the exposure process is likely to affect the performance of quantum dots.
[0005] In summary, the existing technology cannot make a patterned high-resolution quantum dot layer
Similarly, inorganic nanoparticles with properties similar to quantum dots cannot form patterned high-resolution films according to existing technologies.

Method used

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  • Method for patterning nanoparticle layer, quantum dot light emitting device and display apparatus
  • Method for patterning nanoparticle layer, quantum dot light emitting device and display apparatus
  • Method for patterning nanoparticle layer, quantum dot light emitting device and display apparatus

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0120] 1.1 Nanoparticle treatment

[0121] 1.1.1 Mix the ligand containing adenine (A) and the nanoparticle solution, precipitate after stirring, and centrifuge to obtain adenine-modified nanoparticles (A-NPs);

[0122] 1.1.2 The ligand containing thymine (T) and the nanoparticle solution were mixed, stirred, precipitated, and centrifuged to obtain thymine-modified nanoparticles (T-NPs).

[0123] 1.2 Nanoparticle deposition

[0124] 1.2.1 Chemically modify the substrate to obtain a substrate containing T on the surface; specifically:

[0125]1) Hydroxylation of the substrate: soak the glass substrate in the mixed washing solution of concentrated sulfuric acid and hydrogen peroxide (the volume ratio of concentrated sulfuric acid: hydrogen peroxide is 7:3), heat it to 80 degrees Celsius for 5 hours, and wash it with deionized water after the reaction , to obtain a hydroxylated glass substrate; 2) chemical modification: soak the substrate in a toluene solution (0.5mmol / L) conta...

Embodiment 2

[0131] 2.1 Quantum dot processing

[0132] According to the scheme of 1.1.1, quantum dots 1, 2, and 3 were modified with ligands containing A, T, G, C, X, and Y bases, respectively, to obtain corresponding quantum dots A-NPs 1, T-NPs 1, G-NPs 2, C-NPs 2, X-NPs 3, Y-NPs 3.

[0133] 2.2 Substrate processing and deposition

[0134] 2.2.1 Use methods such as printing, transfer printing, and exposure to modify different preset regions of the substrate with bases containing T, C, and Y;

[0135] 2.2.2 Coating A-NPs on the modified substrate, and forming an A-NPs quantum dot layer in the T-modified preset area after assembly;

[0136] 2.2.3 Coating T-NPs on the substrate, the surface of A-NPs will continue to deposit T-NPs;

[0137] 2.2.4 Repeat the two steps 2.2.2 and 2.2.3 to form a NPs 1 quantum dot layer in the preset area modified by T, and no quantum dots are deposited in the positions modified by C and Y;

[0138] 2.2.5 Alternately coat G-NPs 2, C-NPs 2, X-NPs 3, and Y-NPs...

Embodiment 3

[0140] 3.1 Quantum dot processing

[0141] 3.1.1 Mix the ligand containing adenine (A) and the quantum dot solution, precipitate after stirring, and centrifuge to obtain adenine-modified quantum dots (A-NPs);

[0142] 3.1.2 Mix the ligand containing thymine (T) and the quantum dot solution, stir, precipitate, and centrifuge to obtain thymine-modified quantum dots (T-NPs).

[0143] 3.2 Substrate processing and deposition

[0144] 3.2.1 Coat zinc oxide quantum dots on the Qled substrate containing the pixel structure, anneal at 30mg / mL, 2000rpm, and 100°C for 30 minutes to obtain a zinc oxide film.

[0145] Print a solution (0.5mmol / L) containing 1H, 1H, 2H, 2H-perfluorododecyltrichlorosilane in the desired pixel, let it stand for 10 minutes, and rinse with toluene to obtain a C8F17 group containing the substrate.

[0146] The compound containing the base T and C8F17 group was dissolved in the solution (1 mg / mL), and the substrate was immersed in it at room temperature for 10...

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Abstract

The invention relates to the field of display, in particular to a method for patterning a nanoparticle layer, a quantum dot light emitting device and a display apparatus. The method for patterning a nanoparticle layer comprises the following steps: (S1) a first base is connected to the surface of a preset area of a substrate to form a substrate modified with the first base; (S2) nanoparticles aredeposited in the preset area of the substrate, wherein the ligand of the nanoparticles contains a second base, the first base and the second base are self-assembled into a nanoparticle layer by hydrogen bonding; and (S3) the nanoparticles not involved in hydrogen bonding are removed. A nanoparticle layer, especially a quantum dot layer, can be patterned without ink-jet printing or photolithography, and a nanoparticle layer with high resolution and good performance can be formed.

Description

technical field [0001] The invention relates to the display field, in particular to a method for patterning a nano particle layer, a quantum dot light-emitting device and a display device. Background technique [0002] With the in-depth development of quantum dot preparation technology, the stability and luminous efficiency of quantum dots continue to improve, and the research on quantum dot electroluminescent diodes (Quantum Light Emitting Diode, QLED) continues to deepen, and the application prospects of QLED in the display field are increasingly bright. However, the production efficiency of QLED has not yet reached the level of mass production. The most important reason is that the high-resolution patterning technology of QLED has not yet achieved a breakthrough. [0003] Quantum dots are zero-dimensional nano-semiconductor materials. The size of the three dimensions of quantum dots is not greater than twice the exciton Bohr radius of the corresponding semiconductor mater...

Claims

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Application Information

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IPC IPC(8): H01L51/56H01L51/50H01L27/32
CPCH10K50/115C09K11/06B82Y20/00B82Y40/00H10K59/35H10K71/13H10K71/236B82Y30/00C09K2211/1048C09K2211/1074H10K50/15H10K50/16H10K71/00
Inventor 张振琦
Owner BOE TECH GRP CO LTD
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