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Single element multilayer infrared high-reflection film and preparation method thereof

A high-reflection film, single-element technology, used in coatings, metal material coating processes, ion implantation plating, etc., can solve the problems of corrosion resistance of thin-film components, and achieve good bonding performance, wide application range, and easy implementation. Effect

Active Publication Date: 2019-09-10
XIAN TECH UNIV
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Problems solved by technology

[0008] The purpose of the present invention is to provide a single-element multi-layer infrared high-reflection film, which can not only effectively improve its mechanical properties, but also solve the problem of corrosion resistance of thin film elements

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  • Single element multilayer infrared high-reflection film and preparation method thereof
  • Single element multilayer infrared high-reflection film and preparation method thereof
  • Single element multilayer infrared high-reflection film and preparation method thereof

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Embodiment Construction

[0028] The present invention will be further described below in conjunction with the embodiments and accompanying drawings, but the protection scope of the present invention should not be limited thereby.

[0029] see figure 1 , a single-element multi-layer infrared high-reflection film is characterized in that it is composed of a multi-layer DLC film coated with a substrate and a graphite target, and the basic structure of the film system is: S / (HL) x H / A, where S is the Si substrate, H is the DLC film with high refractive index, L is the DLC film with low refractive index, x is the cycle number of repeated plating of H and L, and A is air.

[0030] It can be seen from the figure that the high-reflection film is composed of two materials with different refractive indices, H and L. Among them, the DLC film plated by pulsed arc technology is recorded as DLC-P, and the film plated by unbalanced magnetron sputtering technology is denoted as DLC-P. The DLC film is denoted as DLC-...

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Abstract

The invention relates to a single element multilayer infrared high-reflection film and a preparation method thereof. The film structure consists of a substrate and a multilayer DLC film plated by a graphite target material, and the basic structure of the film system is as follows: S / (HL)xH / A, wherein S is a Si substrate, H is a DLC film with high refractive index, L is a DLC film with low refractive index, x is the number of cycles of H and L repeated plating, and A is air. The single element multilayer infrared high-reflection film provided by the invention effectively improves the mechanicalproperty, and has high chemical stability and wide application range; and meanwhile, the preparation method is simple and easy to implement, and meets the requirement of large-scale industrial production.

Description

technical field [0001] The invention belongs to the technical field of optical film design and preparation, and in particular relates to a multilayer infrared high-reflection film completely composed of a single element. [0002] technical background [0003] In order to obtain good optical performance and imaging quality, the surface of optical components generally needs to be coated with a thin film with specific functions. The functions that a single-layer thin film can achieve are very limited. According to the basic theory of thin-film optics, a multi-layer film composed of two high and low refractive index materials alternately can obtain excellent optical properties. Therefore, commonly used optical films such as broadband anti-reflection films, high-reflection films, filter films, polarizing films, etc. are multi-layer film structures obtained by alternate plating with two (or more) coating materials with different refractive indices. [0004] At present, the high re...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G02B5/08C23C14/35C23C14/06C23C14/58
CPCC23C14/0605C23C14/3485C23C14/35C23C14/5806G02B5/08
Inventor 徐均琪苏俊宏吴慎将惠迎雪梁海锋李阳诗云云
Owner XIAN TECH UNIV
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