Tin alloy plating solution
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- MITSUBISHI MATERIALS CORP
- Publication Date
- 2019-09-17
- Estimated Expiration
- Not applicable · inactive patent
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Figure 1
Abstract
Description
technical field
[0001] The invention relates to a tin alloy plating solution for forming a tin alloy plating film by an electroplating method. More specifically, it relates to a tin alloy plating solution suitable for forming solder bumps for semiconductor wafers and printed circuit boards. In addition, this international application claim is based on Japanese Patent Application No. 15219 (Patent Application 2017-15219) filed on January 31, 2017 and Japanese Patent Application No. 222433 (Patent Application 2017-222433) filed on November 20, 2017 Priority right of patent application 2017-15219 and patent application 2017-222433 are used in this international application. Background technique
[0002] It is known that in a tin alloy plating bath (liquid) for forming a tin alloy coating film on a conductive object, such as a tin-silver alloy coating film, there is a large difference in redox potential between tin ions and other metal ions (such as silver ions) in the bath. W...