GaN-based light-emitting diode epitaxial wafer and manufacturing method thereof
A technology for light-emitting diodes and a manufacturing method, which is applied to electrical components, circuits, semiconductor devices, etc., can solve problems such as reducing the luminous efficiency of LEDs, and achieve the effects of improving luminous efficiency and increasing the number of holes
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[0030] In order to make the object, technical solution and advantages of the present invention clearer, the implementation manner of the present invention will be further described in detail below in conjunction with the accompanying drawings.
[0031] An embodiment of the present invention provides a GaN-based light-emitting diode epitaxial wafer. figure 1A schematic structural diagram of a GaN-based light-emitting diode epitaxial wafer provided by an embodiment of the present invention. see figure 1 , the GaN-based light-emitting diode epitaxial wafer includes a substrate 10 , a buffer layer 20 , an N-type layer 30 , a multi-quantum well layer 40 , an electron blocking layer 50 and a P-type layer 60 stacked in sequence.
[0032] figure 2 Schematic diagram of the structure of the electron blocking layer provided by the embodiment of the present invention. see figure 2 , the electron blocking layer 50 is composed of a plurality of first composite structures 500 stacked i...
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