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Cleaning agent and cleaning method for developing solution filter

A cleaning agent and filter technology, applied in chemical instruments and methods, membrane technology, semi-permeable membrane separation, etc., can solve problems such as unsatisfactory cleaning effect, improve flushing effect, restore membrane flux, and increase contact area Effect

Active Publication Date: 2022-01-04
DONGGUAN DONGYUAN ENVIRONMENTAL TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the cleaning effect of the above method is still not ideal.

Method used

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  • Cleaning agent and cleaning method for developing solution filter
  • Cleaning agent and cleaning method for developing solution filter

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0039] A cleaning agent for developer filter, including cleaning agent A and cleaning agent B;

[0040] The cleaning agent A comprises the following components: H 2 SO 4 2wt%, H 2 o 2 2wt‰, the balance is water;

[0041] The cleaning agent B includes the following components: NaClO 4wt%, sodium dodecylbenzene sulfonate 2wt‰, disodium edetate 1wt‰, and the balance is water.

[0042] A cleaning method for a developing solution filter as described above, comprising the steps of:

[0043] (1) One-time water washing: rinse the filter assembly with clean water, and then drain the water;

[0044] (2) Pickling: Use cleaning agent A to carry out forward flushing on the filter assembly, then carry out heating and soaking treatment, and finally carry out reverse flushing;

[0045] (3) Secondary water washing: empty the cleaning agent A in step (2), then use clear water to rinse the filter assembly, and then empty the water;

[0046] (4) Alkaline cleaning: use cleaning agent B to c...

Embodiment 2

[0054] A cleaning agent for developer filter, including cleaning agent A and cleaning agent B;

[0055] The cleaning agent A comprises the following components: H 2 SO 4 1wt%, H 2 o 2 3wt‰, the balance is water;

[0056] The cleaning agent B includes the following components: NaClO 3wt%, sodium dodecylbenzenesulfonate 3wt‰, disodium edetate 1.5wt‰, and the balance is water.

[0057] A cleaning method for a developing solution filter as described above, comprising the steps of:

[0058] (1) One-time water washing: rinse the filter assembly with clean water, and then drain the water;

[0059] (2) Pickling: Use cleaning agent A to carry out forward flushing on the filter assembly, then carry out heating and soaking treatment, and finally carry out reverse flushing;

[0060] (3) Secondary water washing: empty the cleaning agent A in step (2), then use clear water to rinse the filter assembly, and then empty the water;

[0061] (4) Alkaline cleaning: use cleaning agent B to ...

Embodiment 3

[0069] A cleaning agent for developer filter, including cleaning agent A and cleaning agent B;

[0070] The cleaning agent A comprises the following components: H 2 SO 4 3wt%, H 2 o 2 1wt‰, the balance is water;

[0071] The cleaning agent B includes the following components: NaClO 5wt%, sodium dodecylbenzenesulfonate 1wt‰, disodium edetate 0.5wt‰, and the balance is water.

[0072] A cleaning method for a developing solution filter as described above, comprising the steps of:

[0073] (1) One-time water washing: rinse the filter assembly with clean water, and then drain the water;

[0074] (2) Pickling: Use cleaning agent A to carry out forward flushing on the filter assembly, then carry out heating and soaking treatment, and finally carry out reverse flushing;

[0075] (3) Secondary water washing: empty the cleaning agent A in step (2), then use clear water to rinse the filter assembly, and then empty the water;

[0076] (4) Alkaline cleaning: use cleaning agent B to ...

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Abstract

The invention relates to the technical field of filter cleaning, in particular to a cleaning agent and a cleaning method for a developing solution filter. In the pickling process of the present invention, the micellar impurities can be shrunk, so that the gap between the micellar impurities and the filter holes becomes larger, which is beneficial to the penetration of the cleaning agent A and the subsequent cleaning agent B, and the membrane micropores are more fully washed, and at the same time The elevated temperature immersion of cleaning agent A can enhance the oxidation of hydrogen peroxide and oxidize the micellar impurities into smaller particles, so as to prevent them from hardening and adhering to the filter hole wall. In the alkali cleaning process of the present invention, under the situation that ceramic film still remains a small amount of small particle after pickling, colloid particle can be made to expand, thereby promotes its contact area with water flow, improves flushing effect; In addition, in NaClO, twelve Under the action of sodium alkylbenzenesulfonate, disodium ethylenediaminetetraacetic acid and elevated temperature soaking, the swollen colloidal particles will not agglomerate into agglomerates, and the membrane flux can be easily restored by backwashing.

Description

technical field [0001] The invention relates to the technical field of filter cleaning, in particular to a cleaning agent and a cleaning method for a developing solution filter. Background technique [0002] The general composition of PCB dry film developer is Metol, hydroquinone, sodium carbonate, sodium hypochlorite and water. The main purpose of using a developer is to remove the bridged ink that has not been exposed to UV light. The reaction formula of ink chemical structure during developing process is: [0003] [0004] It can be seen from the chemical structural reaction formula that sodium bicarbonate and resin micelles impurities are generated after development. Therefore, when the ceramic membrane is filtered, the sodium bicarbonate is reused, and the resin micelles and other inorganic dirt are trapped, and with the use of the ceramic membrane, the resin micelles and other inorganic dirt gradually foul the membrane pores. [0005] In order to restore the flux...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B01D65/06
CPCB01D65/02B01D2321/162B01D2321/164B01D2321/04
Inventor 肖应东肖勇辉徐蓉珊赖辉
Owner DONGGUAN DONGYUAN ENVIRONMENTAL TECH CO LTD