A kind of graphene surface plasma modification treatment device and treatment method

Abstract

The invention provides a graphene surface plasma modification treatment device and a graphene surface plasma modification treatment method and belongs to the technical field of graphene surface treatment, in particular to the graphene surface plasma modification treatment device and the graphene surface plasma modification treatment method. The graphene surface plasma modification treatment deviceand the graphene surface plasma modification treatment method solve the problem that existing methods of treating graphene by way of ultrasonic waves, heating or air flows and the like are low in yield, sheets are agglomerated severely, a lot of structural flaws of graphene are induced by long-time ultrasonic treatment, relatively more surfactants or surface activating substances are introduced,and solves the problem that an existing plasma treatment method only can be acted to the surface layer where graphene is accumulated. The graphene surface plasma modification treatment device comprises a vacuum chamber, a glass container, a radio-frequency power supply system, a counter electrode and a rotating mechanism. The vacuum chamber is of a horizontal structure, the counter electrode is ofan arc-shaped structure, the cylindrical glass container is placed in the middle of the counter electrode, and the glass container is connected to the rotating mechanism. The invention also relates to a corresponding treatment method. The graphene surface plasma modification treatment device and the graphene surface plasma modification treatment method are primarily applied to graphene surface modification treatment.

Description

technical field [0001] The invention belongs to the technical field of graphene surface modification, in particular to a graphene surface plasma modification treatment device and treatment method. Background technique [0002] Plasma technology is often used for surface modification of materials, and graphene is also widely used in various fields. Effectively dispersing surfactant-free graphene in aqueous solution has always been the dream of material scientists. However, due to the hydrophobicity of the graphene surface, it is difficult to Evenly dispersed in water, it is easy to agglomerate, which also limits the application and development of graphene. At present, graphene solutions are mainly obtained by means of ultrasonic waves, heating or air flow, but these methods also have low yields and serious sheet agglomeration. 1. Long-time ultrasound causes a large number of structural defects in graphene, and the need to introduce more surfactants or surface active substance...

AI Technical Summary

Problems solved by technology

[0002] Plasma technology is often used for surface modification of materials, and graphene is also widely used in various fields. Effectively dispersing surfactant-free graphene in aqueous solution has always been the dream of material scientists. However, due to the hydrophobicity of the graphene surface, it is difficult to Evenly dispersed in water, it is easy to agglomerate, which also limits the application and development of graphene. At present, graphene solutions are mainly obtained by means of ultrasonic waves, heating or air flow, but these methods also have low yields and serious sheet agglomeration. , Long-term ultrasonication causes a large number of structural defects in graphene, and the need to introduce more surfactants or surface active substances, which greatly restricts these preparation methods

At present, there are also related researches on the surface plasma modification of graphene, but generally, graphene is stacked in a tiled manner, and the plasma can only act on the surface layer of graphene stacking, and the graphene inside cannot be modified. There is an urgent need for a device and processing method that can realize industrial production

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