Corrected binary particle gap accumulation design method based on mutual influence among particles

A technology of mutual influence and particle accumulation, applied in the field of material accumulation, can solve the problems of insufficient contact, large void ratio of binary particle accumulation system, etc., and achieve the effect of improving compactness

Active Publication Date: 2019-11-05
NORTHEASTERN UNIV
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Problems solved by technology

[0003] In the conventional binary particle packing system, due to the existence of the above phenomenon, the void ratio of the binary particle packing system is re...

Method used

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  • Corrected binary particle gap accumulation design method based on mutual influence among particles
  • Corrected binary particle gap accumulation design method based on mutual influence among particles
  • Corrected binary particle gap accumulation design method based on mutual influence among particles

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Embodiment

[0074] According to the inventive method to total volume be 1m 3 The void accumulation of the binary particles is designed, the particle size of the large particle and the small particle are 10mm and 1mm respectively; the void ratio of the one-dimensional accumulation is 0.5 and 0.43 respectively, and the apparent density is 2727.5kg / m3 3 、2607kg / m 3 . Conventional binary particle void packing considers that the gaps between particles are as follows: figure 2 The ideal state shown is that the small particles fully fill the voids of the large particles, and there is no influence between the two. The mass of large and small particles m 1 、m 2 They are:

[0075] m 1 =1×(1-0.5)×2727.5=1363.75kg

[0076] m 2 =1×0.5×(1-0.43)×2607=742.995kg

[0077] According to the total volume and the volume of large and small particles, the porosity of the binary particle void packing system is calculated as 0.215.

[0078] However, due to the interaction between particles, such as im...

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Abstract

The invention discloses a corrected binary particle gap accumulation design method based on mutual influence among particles. The method comprises the following steps: designing the proportion of twoparticles in a conventional binary particle accumulation system; correcting the binary particle accumulation system based on the mutual influence among the particles; establishing a corrected binary particle accumulation system, and solving the accumulation void ratio of two kinds of particles in the corrected binary particle accumulation system; and solving the respective mass of the two kinds ofparticles in a certain container with the volume of V. According to the method, the influence of two kinds of particles with different particle sizes on mutual space occupation in a binary particle mixed accumulation system is introduced on the basis of a binary particle gap accumulation design method of mutual influence between particles. The proportion of the two particles in the binary particle accumulation system is corrected by considering the influence of the particle size ratio of the two particles in the accumulation system. The porosity of the corrected actual binary accumulation system is reduced. The two kinds of particles can be in full contact, which are uniformly distributed and are interlocked with each other.

Description

technical field [0001] The invention belongs to the field of material accumulation, and relates to a design method for modifying binary particle void accumulation based on the interaction between particles. Background technique [0002] In the field of particle packing, the existing binary particle packing method designs the packing system based on the gaps of particles, that is, the volume fraction of small particles is determined according to the gaps of large particles, without considering the interaction between particles. However, in the actual stacking process, since the small particles not only exist in the gaps between the large particles, but also loosen the large particles, the actual void ratio of the large particles in the binary particle stacking system becomes larger; and the small particles While the particles exist in the voids of large particles, there will be a considerable part of the particles in contact with the large particles, and this part of the smal...

Claims

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Application Information

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IPC IPC(8): G06F17/50
Inventor 程云虹朱宝龙邱伟王述红
Owner NORTHEASTERN UNIV
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