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Blended self-assembly of brush-like block polymers and its application

A technology of block polymer and self-assembly, applied in the field of blended self-assembly of brush-shaped block polymers, can solve the problems of cumbersome and troublesome methods, and achieve the effect of great practical value

Inactive Publication Date: 2021-08-13
TIANJIN UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Although this method can prepare photonic crystals with controllable reflection wavelengths, it often requires a variety of brush-shaped block polymers with different molecular weights to self-assemble separately, which is cumbersome and cumbersome.

Method used

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  • Blended self-assembly of brush-like block polymers and its application
  • Blended self-assembly of brush-like block polymers and its application
  • Blended self-assembly of brush-like block polymers and its application

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0045] Blending self-assembly method of DBCP1 and DBCP2:

[0046] (1) Synthesis of DBCP1:

[0047] Add norbornene monomer NBPM (57.6mg, 91.2μmol) to a 10mL polymerization bottle, add G-3 (0.27mg, 0.31×10 -3 mmol) in dichloromethane solution 0.1mL, stirred and reacted at room temperature for 30 minutes, then added 1.1mL of dichloromethane solution containing norbornene monomer NDM (72.2mg, 91.2μmol) to the above reaction solution to continue the reaction 1 hour, the whole addition and reaction process were carried out in the glove box. After the reaction was complete, 1 mL of vinyl ether was added to quench the reaction. Remove from the glove box, precipitate in anhydrous methanol, centrifuge, and vacuum dry to obtain a brush-like block polymer DBCP1 with a main chain polymerization degree of 600, wherein the polymerization degree of NBPM is 300, and the polymerization degree of NDM is 300.

[0048] Where: the structural formula of NBPM is:

[0049]

[0050] The structur...

Embodiment 2

[0059] Blending self-assembly method of DBCP2 and DBCP3:

[0060] (1) Synthesis of DBCP2:

[0061] The specific process is the same as the synthesis steps of DBCP2 in Example 1.

[0062] (2) Synthesis of DBCP3:

[0063] Add NBPM (57.6mg, 91.2μmol) to a 10mL polymerization bottle, 1mL dry dichloromethane, add G-3 (0.16mg, 0.18×10 -3 mmol) in dichloromethane solution 0.1mL, stirred and reacted at room temperature for 30 minutes, then added 1.1mL of dichloromethane solution containing NDM (72.2mg, 91.2μmol) into the above reaction solution and continued to react for 1 hour, the whole addition Both reactions were carried out in a glove box. After the reaction was complete, 1 mL of vinyl ether was added to quench the reaction. Remove from the glove box, precipitate in anhydrous methanol, centrifuge, and vacuum dry to obtain a brush-like block polymer DBCP3 with a main chain polymerization degree of 1000, wherein the polymerization degree of NBPM is 500, and the polymerization d...

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Abstract

The invention discloses a blended self-assembly of a brush-shaped block polymer and its application. The general formula of the brush-shaped block polymer is PNBPM-b-PNDM, when m=300-400, n=300- 400, the brush-shaped block polymer PNBPM-b-PNDM is denoted as P1; when m=400-500, n=400-500, the brush-shaped block polymer PNBPM-b-PNDM is denoted as P2 , and the degree of polymerization of the monomers in P1 and P2 is different; the blended self-assembly exhibits a blue-shift of the reflection wavelength from the center to the edge. The blended self-assembly is a circular thin film, and the main reflection wavelength at different points on the radial line of the circular thin film has a linear relationship with the distance from the point to the center of the photonic crystal thin film.

Description

technical field [0001] The invention relates to the technical field of self-assembly of block copolymers, in particular to a blended self-assembly of brush-like block polymers and its application. Background technique [0002] Due to the existence of the internal photonic bandgap structure, photonic crystals can regulate the propagation of light waves, so that they have great application value, such as making special pigments, waveguides and reflective coatings, etc. Responsive photonic crystals are a class of materials whose reflection wavelength can change with changes in external physical or chemical conditions. In addition to the periodic structure necessary for traditional photonic crystals, this material must also have responsive groups. There are two common ways to introduce responsive groups: (1) Use responsive materials as substrates to directly construct photonic crystal structures, such as using block polymer self-assembly to prepare one-dimensional photonic crys...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C08L53/02C08F293/00C08F232/08
CPCC08F232/08C08F293/005C08L53/02C08L2203/20C08L2205/025
Inventor 任丽霞张同周袁晓燕
Owner TIANJIN UNIV