Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Novel louver bottom mounting structure and mechanical five-parameter structure thereof

A technology for installing structures and shutters, which is applied in the direction of measuring devices, measuring device casings, instruments, etc., can solve problems such as affecting data accuracy, unsightly appearance, and difficulty in installation, so as to solve the impact of measuring data accuracy and achieve high overall integration. , the effect of saving internal space

Pending Publication Date: 2019-11-22
TIANJIN TONGYANG TECH DEV
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] 2. Too high or too low air pressure will affect people's psychological activities, and even produce harmful effects
[0005] 3. Humidity plays an important role in the heat balance of the human body. People feel bored at high temperature and high humidity, and dry mouth and tongue at low temperature and low humidity, which may also lead to chapped skin
[0006] 4. Wind energy promotes the exchange of dry and cold air and warm and humid air, affects climate change, and affects the ventilation of living rooms and the heat dissipation of the human body
[0008] 1. The temperature, humidity and pressure acquisition board is installed in the structural parts of the aluminum shell, which will cause condensation problems due to temperature differences, which will affect the accuracy of the data. On the other hand, it is also difficult to install; 2. The installation method of the louver base and the chassis is in the The interior of the chassis is connected by screws, which is extremely difficult to operate; 3. The meteorological five-parameter processing board has a large area and is installed inside the chassis, occupying space, and the line connections are exposed inside the chassis, which is not easy to manage and is not beautiful

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Novel louver bottom mounting structure and mechanical five-parameter structure thereof
  • Novel louver bottom mounting structure and mechanical five-parameter structure thereof
  • Novel louver bottom mounting structure and mechanical five-parameter structure thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0024] The specific implementation manner of the present invention will be described in detail below in conjunction with the accompanying drawings and preferred embodiments. Such as figure 1 As shown, a new louver bottom installation structure includes a louver base 1, a chassis connector 2, and a meteorological five-parameter processing board 3, and the meteorological five-parameter processing board integrates electronic components. The louver base is provided with an inner slot 4, and the inner slot is a circular structure, and the meteorological five-parameter processing plate is installed in the inner slot, specifically, the bottom of the inner slot is fixed with a copper column 5 , the meteorological five-ginseng processing board is fixed on the copper column by screws 6, which is convenient for assembly, effectively saves the internal space of the chassis, and optimizes the utilization rate of the space of the chassis. The circular meteorological five-parameter processi...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to the technical field of environmental monitoring equipment, in particular, to a novel louver bottom mounting structure, which includes a louver base, a case connector, and a meteorological five-parameter processing board. An inner slot hole is formed in the louver base; the meteorological five-parameter processing board is installed in the inner slot hole; the inner slot hole of the louver base is fastened to thecase connector in a close fit relationship. The meteorological five-parameter processing board is arranged in the louver base, so that the internal space of thecase is saved effectively and the utilization of the case space is optimized.

Description

technical field [0001] The invention relates to the technical field of environmental monitoring equipment, in particular to a novel louver bottom structure and its mechanical five-parameter structure. Background technique [0002] Meteorological parameters belong to the physical factors of the natural environment and are important indicators to describe the physical state and characteristics of the air. They have hygienic significance and are closely related to human health. Dramatic changes in meteorological parameters can cause many diseases, timely measurement of meteorological parameters is helpful to guide people to take measures to prevent the occurrence of diseases. In the air physical and chemical inspection work, meteorological parameters have a great influence, and relevant meteorological parameters must be determined during sampling. Hygienic significance: [0003] 1. Temperature is a major environmental factor affecting thermoregulation. [0004] 2. Too high o...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G01W1/02G01D11/00G01D11/24
CPCG01D11/00G01D11/245G01W1/02
Inventor 何志同赵超龙张红星高建民
Owner TIANJIN TONGYANG TECH DEV
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products