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Fluoride-free low-temperature corrosive agent and preparation method

A etchant and low temperature technology, applied in the field of fluorine-free low temperature etchant and preparation, can solve the problems of high energy consumption, large environmental pollution and high cost, and achieve the effects of low energy consumption, good corrosion effect and low cost

Inactive Publication Date: 2019-11-29
NIPPON PAINT CHONGQING CHEM CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] However, the existing etchant used in the pre-treatment process section of the aluminum can production line is a high-temperature etchant containing fluorine, and the aluminum can and the attached aluminum powder are treated with a high-temperature etchant. However, fluorine pollutes the environment and requires high-temperature treatment. high consumption, high cost

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0025] A fluorine-free low-temperature etchant, including a cleaning agent and an etching agent, the cleaning agent is obtained in the following weight percentages: 5% sulfuric acid, 1% oxidant, 1% surfactant, and 93% deionized water; the etching agent is obtained in the following weight percentages : Strong oxidant solution 1%, sulfuric acid 5%, deionized water 94%.

Embodiment 2

[0027] A fluorine-free low-temperature etchant, including a cleaning agent and an etchant; the cleaning agent is obtained in the following weight percentages: 30% of sulfuric acid, 10% of ferric salt, 10% of a low-temperature amphoteric surfactant, and 50% of deionized water; the etchant , obtained by using the following weight percentages: 3% hydrogen peroxide solution, 7% sulfuric acid, and 90% deionized water.

Embodiment 3

[0029] A fluorine-free low-temperature etchant, including cleaning agent and etchant. The cleaning agent is obtained in the following weight percentages: 40% of sulfuric acid, 20% of tetravalent vanadium salt, 15% of surfactant, and 25% of deionized water; the etching agent is obtained in the following weight percentages: 5% of sodium peroxide solution, 10% of sulfuric acid %, deionized water 85%.

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PUM

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Abstract

The invention relates to the technical field of etching agents, and discloses a fluoride-free low-temperature corrosive agent comprising a cleaning agent and an etching agent. Water is used as solventof the cleaning agent. The fluoride-free low-temperature corrosive agent further comprises inorganic acid, an oxidizing agent and a surface active agent. The fluoride-free low-temperature corrosive agent comprises, by weight, 5%-70% of the inorganic acid, 1%-25% of the oxidizing agent, 1%-15% of the surface active agent and the balance water. The inorganic acid is sulfuric acid. The concentrationof the sulfuric acid is 30%. The oxidizing agent comprises ferric iron slat or tetravalent vanadium slat. The concentration of the oxidizing agent is 5%. The surface active agent comprises a low-temperature ampholytic surface active agent or a non-ionic surface active agent. The concentration of the surface active agent is 10%. Water is used as the etching agent. The fluoride-free low-temperaturecorrosive agent further comprises sulfuric acid and a strong oxidant solution. A strong oxidant comprises hydrogen peroxide or sodium peroxide. The fluoride-free low-temperature corrosive agent comprises, by weight, 5%-10% of the sulfuric acid, 1%-5% of the strong oxidant solution and the balance water. The invention further discloses a preparation method of the fluoride-free low-temperature corrosive agent. The fluoride-free low-temperature corrosive agent and the preparation method have the effects of being capable of saving energy and being environment-friendly, low in energy consumption,low in cost and little in pollution.

Description

technical field [0001] The invention relates to the technical field of etchant, in particular to a fluorine-free low-temperature etchant and a preparation method. Background technique [0002] Etching is a technique that removes the surface of a material by chemical reaction or physical impact. Etching using etchant is a kind of chemical etching. When the material contacts the etching solution, the surface layer of the material and the newly formed surface layer are continuously dissolved and corroded by the etching solution, so as to achieve the effect of cleaning the surface of the material. [0003] However, the existing etchant used in the pre-treatment process section of the aluminum can production line is a high-temperature etchant containing fluorine, and the aluminum can and the attached aluminum powder are treated with a high-temperature etchant. However, fluorine pollutes the environment and requires high-temperature treatment. High consumption and high cost. C...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23F1/20
CPCC23F1/20
Inventor 杨德理温由建王浩黄长华王小红
Owner NIPPON PAINT CHONGQING CHEM CO LTD