Grayscale photomask and manufacturing method of display substrate
A technology of grayscale mask and manufacturing method, which is applied in the photoplate making process of the pattern surface, the original for photomechanical processing, optics, etc., and can solve the problem of affecting product quality, small exposure, and the second film liner 202 To prevent peeling and other problems, to achieve the effect of preventing peeling and improving the stability of film formation
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[0042] In order to further illustrate the technical means adopted by the present invention and its effects, the following describes in detail in conjunction with preferred embodiments of the present invention and accompanying drawings.
[0043] see Figure 2 to Figure 5 . The present invention provides a gray scale photomask, comprising a light-transmitting area 31 and a light-shielding area 32 surrounding the light-transmitting area 31 , and the light-transmitting area 31 includes the first film liner 41 arranged in sequence for forming the first A light-transmitting region 311 and a second light-transmitting region 312 for forming the second film liner 42, the first light-transmitting region 311 is completely light-transmitting, and the second light-transmitting region 312 is partially light-transmitting;
[0044] The thickness of the first film liner 41 is greater than that of the second film liner 42, and the second light-transmitting region 312 has undergone anti-peeling ...
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