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Grayscale photomask and manufacturing method of display substrate

A technology of grayscale mask and manufacturing method, which is applied in the photoplate making process of the pattern surface, the original for photomechanical processing, optics, etc., and can solve the problem of affecting product quality, small exposure, and the second film liner 202 To prevent peeling and other problems, to achieve the effect of preventing peeling and improving the stability of film formation

Active Publication Date: 2020-09-01
SHENZHEN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] In the existing BPS type product structure, such as figure 1 As shown, under the main spacer 101 and the auxiliary spacer 102, the first film liner 201 and the second film liner 202 are used as the liner carrier, the height between the main spacer 101 and the auxiliary spacer 102 The difference is formed by the thickness difference between the first film liner 201 and the second film liner 202, and the heights of the main spacer 101 and the auxiliary spacer 102 themselves are the same. The prior art forms the first film liner 201 The height difference between the first film liner 201 and the second film liner 202 is generally formed by gray-scale mask (Gray Tone Mask, GTM) technology, the so-called gray-scale mask is the A photomask forms two kinds of light-transmitting areas: completely light-transmitting and partially light-transmitting areas, wherein the partially light-transmitting light-transmitting areas are formed by alternately arranging light-shielding strips and light-transmitting slits. The widths of all light-shielding strips and light-transmitting slits in the light-transmitting area are equal, but in actual exposure, because the exposure of the light-transmitting slits at the first and last ends is often smaller than the exposure of the middle light-transmitting slit, and then The thickness of the edge of the second film liner 202 is different from the thickness in the middle of the second film liner 202, and even causes peeling (Peeling) at the edge of the second film liner 202, seriously affecting product quality

Method used

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  • Grayscale photomask and manufacturing method of display substrate
  • Grayscale photomask and manufacturing method of display substrate
  • Grayscale photomask and manufacturing method of display substrate

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Embodiment Construction

[0042] In order to further illustrate the technical means adopted by the present invention and its effects, the following describes in detail in conjunction with preferred embodiments of the present invention and accompanying drawings.

[0043] see Figure 2 to Figure 5 . The present invention provides a gray scale photomask, comprising a light-transmitting area 31 and a light-shielding area 32 surrounding the light-transmitting area 31 , and the light-transmitting area 31 includes the first film liner 41 arranged in sequence for forming the first A light-transmitting region 311 and a second light-transmitting region 312 for forming the second film liner 42, the first light-transmitting region 311 is completely light-transmitting, and the second light-transmitting region 312 is partially light-transmitting;

[0044] The thickness of the first film liner 41 is greater than that of the second film liner 42, and the second light-transmitting region 312 has undergone anti-peeling ...

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Abstract

Disclosed are a gray-tone mask and a method for manufacturing a display substrate. The gray-tone mask comprises a light-transmitting area (31) and a light-shielding area (32) surrounding the light-transmitting area (31), wherein the light-transmitting area (31) comprises a first light-transmitting area (311) for forming a first thin film pad (41) and a second light-transmitting area (312) for forming a second thin film pad (42), and the first light-transmitting area and the second light-transmitting area are sequentially arranged; the first light-transmitting area (311) is fully light transmissive, and the second light-transmitting area (312) is partially light transmissive; the thickness of the first thin film pad (41) is greater than that of the second thin film pad (42); and the second light-transmitting area (312) is subjected to an anti-peeling treatment, so that the thickness of four corners of the second thin film pad (42) formed by the second light-transmitting area (312) is at least 60% of the thickness of the center thereof. Performing an anti-peeling treatment on the second light-transmitting area (312) can effectively improve the film formation stability of the second thin film pad (42) and prevent the second thin film pad (42) from being peeled off.

Description

technical field [0001] The invention relates to the field of display technology, in particular to a method for manufacturing a grayscale mask and a display substrate. Background technique [0002] Liquid crystal display (Liquid Crystal Display, LCD) is currently the most widely used display product in the market. Its production process technology is very mature, the product yield rate is high, the production cost is relatively low, and the market acceptance is high. Most of the liquid crystal displays currently on the market are backlight liquid crystal display devices, which include a liquid crystal display panel and a backlight module. Generally, a liquid crystal display panel is composed of a color filter (Color Filter, CF) substrate, an array (Array) substrate, a liquid crystal sandwiched between the color filter substrate and the array substrate, and a sealant (Sealant). A color filter layer for colored light is formed through a color resist unit (R / G / B), a black matri...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F1/32G02F1/1339G02F1/1333
CPCG02F1/1333G02F1/1339G03F1/32
Inventor 曹武
Owner SHENZHEN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
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