Light transmittance controllable film, its preparation method and application
A technology of light transmittance and thin film, applied in optics, optical components, nonlinear optics, etc., can solve problems such as energy consumption and complex preparation, and achieve high sensitivity and good application value
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[0020] As an aspect of the technical solution of the present invention, what it relates to is a preparation method of a light transmittance controllable film, including:
[0021] pre-stretching the transparent elastic film to make the transparent elastic film in a stretched state;
[0022] Surface treatment is performed on the stretched transparent elastic film to form a hard layer on at least one surface of the transparent elastic film;
[0023] The surface-treated transparent elastic film is stretched twice, and then the stress is slowly released to restore the transparent elastic film to its original state, thereby obtaining a film with adjustable light transmittance.
[0024] In some embodiments, it specifically includes: pre-stretching the transparent elastic film uniaxially, and then performing surface treatment on the transparent elastic film.
[0025] In some embodiments, the transparent elastic film comprises a polydimethylsiloxane film.
[0026] In some embodiments...
Embodiment 1
[0041] Mix and stir 5g of polydimethylsiloxane main agent and curing agent in a mass ratio of 10:1 for 10 minutes, put it in a vacuum oven to filter out the air bubbles, and then drop the polydimethylsiloxane onto PMMA ( Plexiglass plate) surface, spin coating at 600rpm / min in a spin coater for 30s, put it in a vacuum oven and heat it at 75°C for 120min to cure the polydimethylsiloxane film. The methylsiloxane film was peeled off from the PMMA plate and cut into a film of a fixed size. The shape of the film was a rectangle and the size was 1×5 cm (width×length).
[0042] The cut film with a thickness of 1 mm was fixed on a stretching device with a spacing of 3 cm, and was pre-stretched by 20% uniaxially. Then, the polydimethylsiloxane film is put into an ultraviolet ozone cleaning box for surface irradiation, thereby forming a uniform hard layer of silicon oxide on the surface of the film. The working conditions of the UV ozone cleaning box are:
[0043] Power: 250w, working...
Embodiment 2
[0047] A polydimethylsiloxane film was prepared, the shape of the film was a rectangle, the size was 1×5 cm (width×length), and the thickness was 0.1 mm.
[0048] The cut film with a thickness of 0.1 mm was fixed on a stretching device with a spacing of 3 cm, and it was pre-stretched uniaxially by 10%, and then the polydimethylsiloxane film was placed in an oxygen plasma cleaning machine. Surface irradiation is performed to form a uniform hard layer of silicon oxide on the surface of the film. The working conditions of the oxygen plasma cleaner are:
[0049] The power was 100W, the oxygen flow was 10ml / min, and the irradiation time was 2min.
[0050] After the surface treatment was completed, the film was taken out and cooled to room temperature, and then the two ends of the film were stretched twice to generate a strain of 10%. Finally, the stress is slowly released to restore it to the original state, and the transmittance of the film is 43% at this time. When the film wa...
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Abstract
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