Preparation method of black silicon substrate with ultra-low reflectivity micro-nano composite structure

A technology of micro-nano composite structure and reflectivity, which can be used in final product manufacturing, sustainable manufacturing/processing, photovoltaic power generation, etc., can solve the problems of high surface reflectivity and low solar cell efficiency, and achieve low surface reflectivity and high efficiency Preparation, effect of excellent light-harvesting ability

Active Publication Date: 2020-01-24
HARBIN INST OF TECH
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  • Abstract
  • Description
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  • Application Information

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Problems solved by technology

[0004] The invention aims to solve the problem of low solar cell efficiency due to the high surface reflectivity of existing silicon substrates, and provides a method for preparing a black silicon substrate with an ultra-low reflectivity micro-nano composite structure

Method used

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  • Preparation method of black silicon substrate with ultra-low reflectivity micro-nano composite structure
  • Preparation method of black silicon substrate with ultra-low reflectivity micro-nano composite structure
  • Preparation method of black silicon substrate with ultra-low reflectivity micro-nano composite structure

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specific Embodiment approach 1

[0026] Specific Embodiment 1: In this embodiment, a method for preparing a black silicon substrate with an ultra-low reflectivity micro-nano composite structure is carried out according to the following steps:

[0027] 1. Use CuNO at a temperature of 40-100°C 3 , HF and H 2 o 2 The silicon substrate is etched with the mixed solution, and the etching time is controlled to be 1-60 minutes to obtain a silicon substrate with a micron-scale light-trapping structure on the surface;

[0028] 2. Put the silicon substrate obtained in step 1 into AgNO at a temperature of 20-100°C. 3 and HF mixed solution for the deposition of silver nanoparticles;

[0029] 3. Put the silicon substrate deposited in step 2 into HF and H at a temperature of 20-100°C. 2 o 2 In the mixed solution, etch for 10-60 minutes to obtain a silicon substrate with a micro-nano composite structure on the surface;

[0030] 4. Put the silicon substrate obtained in step 3 into HNO at a temperature of 20-100°C 3 Kee...

specific Embodiment approach 2

[0034] Specific embodiment two: the difference between this embodiment and specific embodiment one is that the CuNO described in step one 3 , HF and H 2 o 2 CuNO in mixed solution 3 The concentration of HF is 0.01~5.00mol / L, the concentration of HF is 1~10mol / L, the concentration of H 2 o 2 The concentration is 0.1~10mol / L. Others are the same as in the first embodiment.

[0035] In this embodiment, by controlling the concentration of the HF solution in step 1, the size, depth, occupation ratio and surface reflectance of the black silicon substrate of the obtained micron-scale light-trapping structure can be effectively regulated.

specific Embodiment approach 3

[0036] Embodiment 3: This embodiment differs from Embodiment 1 or Embodiment 2 in that: in step 1, the silicon substrate is (100) plane single crystal silicon. Others are the same as in the first or second embodiment.

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Abstract

The invention relates to a preparation method of a black silicon substrate with an ultra-low reflectivity micro-nano composite structure, relates to the field of preparation of a low reflectivity black silicon substrate, and aims to solve the problem that the surface reflectivity of the existing silicon substrate is high, resulting in low efficiency of the solar cell. The method comprises the steps: a Cu metal catalysis-assisted chemical etching method is used and the silicon substrate is etched with the mixed solution of CuNO3, HF and H2O2 to generate a micron-sized trapped light structure; then the structure is placed in the mixed solution of AgNO3 and HF for self-assembly deposition of silver nanoparticles; and then the mixed solution of HF and H2O2 is adopted for Ag metal catalysis-assisted chemical etching so as to complete the preparation. The silicon substrate with the micro-nano pattern array realizes ultra-low surface reflectivity, efficiently prepares the micro-nano pattern array structure, has high repeatability and can adjust and control the reflectivity by optimizing etching conditions. The black silicon substrate with the ultra-low reflectivity micro-nano composite structure is used in solar cells.

Description

technical field [0001] The invention relates to the field of preparation of low reflectivity black silicon substrates. Background technique [0002] As the commercial solar cell with the highest conversion efficiency and the best industrialization efficiency in the current photovoltaic market, monocrystalline silicon solar cells are widely used in aerospace, agriculture, chemical and energy fields. However, the optical loss on the surface of the silicon substrate is currently the main factor limiting the efficiency of solar cells. In order to improve the cell efficiency of solar cells, the optical loss at the surface of the silicon substrate must be reduced. At present, the methods to reduce the optical loss of the substrate surface mainly include anti-reflective coating on the surface, the use of gate electrodes and surface roughening and texturing, among which surface roughening and texturing are the most commonly used and most effective methods to reduce silicon Substra...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L31/18H01L31/0236
CPCH01L31/02366H01L31/1804Y02E10/547Y02P70/50
Inventor 张丹甘阳申健陈远东汪郑扬
Owner HARBIN INST OF TECH
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