3results about How to "Reduce surface reflectivity" patented technology

This disclosure relates to the field of solar cell manufacturing technology, and discloses a method for fabricating a solar cell and the solar cell itself. The fabrication method includes: providing a substrate layer with a first textured surface; forming an anti-reflection passivation layer on the surface of the substrate layer, the anti-reflection passivation layer conformally covering the first textured surface; laser-treating the anti-reflection passivation layer to form a second textured surface, the second textured surface including multiple micro-recesses; and forming a repair passivation layer on the laser-treated surface of the anti-reflection passivation layer to repair laser damage introduced by the laser treatment, the repair passivation layer conformally covering the second textured surface. This disclosure can ensure the passivation effect of the cell while improving the light-trapping effect of the cell surface.

This invention relates to the field of high-strength steel surface treatment technology, and particularly to a surface treatment liquid, a steel plate for hot stamping without shot blasting, hot stamped parts, and a method for preparing the same. The invention provides a surface treatment liquid, with a total mass of 100 parts, comprising 5-30 parts of water-based resin, 1-60 parts of nano-aluminosilicate and / or modified nano-aluminosilicate, 1-10 parts of surfactant, and the balance being water; the nano-aluminosilicate and / or modified nano-aluminosilicate simultaneously contains Si and Al elements. Applying the surface treatment liquid provided by this invention to the surface of a metal-coated hot stamping steel plate results in a uniform and controllable oxide layer on the surface of the parts obtained after hot stamping, eliminating the need for an additional shot blasting process and avoiding related problems associated with shot blasting, while also meeting the requirements for subsequent welding and electrophoresis.

The invention relates to the technical field of texturing additives for monocrystalline silicon wafers, and discloses a texturing additive for a pyramid textured monocrystalline silicon wafer and a preparation method of the texturing additive. Comprising the following raw materials in parts by mass: 1-1.5 parts of organic sulfonate, 1-2 parts of a polyamine high-molecular compound, 1-2 parts of a high-molecular polymer, 0.5-1 part of a surfactant, 0.2-0.5 part of a composite additive and 90-110 parts of deionized water. The composite additive contains a large number of carboxyl groups, hydroxyl groups and amino groups, the adsorption performance of the texturing additive on the surface of the monocrystalline silicon wafer can be enhanced, then a uniform pyramid structure is formed, the reflectivity is reduced, and the contained modified nano titanium dioxide can form a nano composite film on the surface of the monocrystalline silicon wafer, so that the texturing effect is improved. And the surface roughness and the scattering effect are further improved.