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Method for preparing porous silicon dioxide antireflective film with controllable refractive index

A silica and porous technology, applied in the field of preparation of porous silica anti-reflection films, can solve the problems of limited increase in film hardness and low film hardness, and achieve self-cleaning broadband anti-reflection, high chemical Good stability and self-cleaning effect

Active Publication Date: 2009-09-16
杭州光学精密机械研究所
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, because the porosity of the film layer is as high as about 50%, the hardness of the film layer is low, and the pencil hardness is generally 2 to 3H.
Even if the modification of the coating liquid before coating and the heat treatment or chemical treatment of the film after coating are used, the hardness of the film can be improved to a limited extent.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0024] Below by embodiment the present invention will be further described, but should not limit protection scope of the present invention with this.

[0025] The following table has listed a series of embodiments of the present invention and test result thereof: (ratio is mol ratio in the table)

[0026] Preface

No Base Catalyzed Solution Formulation

TEOS: C 2 h 5 OH:H 2 O:

NH 3 aging

Room (day) Acid Catalytic Solution Formulation

TEOS: C 2 h 5 OH:H 2 o

: HCl aging

Room (day) acid / alkali

silicon content

volume ratio to refract

Rate hard

Spend 1 1∶58.6∶5∶0.3 14 1∶58.7∶5∶0.1 2 1∶5.67 1.26 3H 2 1∶27∶2∶0.9 1 1∶26.5∶4∶0.01 1 1∶4 1.36 6H 3 1∶46.5∶2∶0.9 2 1∶26.5∶4∶0.01 5 1∶4 1.38 7H 4 1∶20.4∶2∶0.9 2 1∶26.5∶4∶0.01 2 1∶1.5 1.40 7H 5 1∶27∶2∶0.9 1 1∶26.5∶4∶0.01 2 1∶2.33 1.42 7H 6 1∶37.2∶4∶0.5 5 1∶36.8∶4∶0.01 20 1∶0.67 1.41 7H 7 1∶37.2∶4∶0.5 5 ...

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Abstract

The invention provides a method for preparing porous silicon dioxide antireflective film with controllable refractive index, which adopts the method of first base catalysis and then acid catalysis for preparing coating liquid and is suitable for dip coating or spraying process or spin-coating method. Porous silicon dioxide basement film layer is coated on a base plate; and the base plate with porous silicon dioxide basement film layer is processed under high temperature so as to obtain the silicon dioxide film layer. The film layer which is prepared by the invention has the advantages of high hardness, high chemical stability, good self-cleaning capability and broadband antireflection.

Description

technical field [0001] The invention relates to an optical anti-reflection film or an anti-reflection film, in particular to a method for preparing a porous silicon dioxide anti-reflection film with controllable refractive index. Background technique [0002] Optical anti-reflection coating (or anti-reflection coating) is applied to the surface of the component through which light passes, which can reduce the light reflection caused by the component surface. Light transmission components include glass windows and lenses in optical systems, architectural window glass, solar energy packaging glass, optical crystals and transparent ceramics, etc. Sol-gel method (wet chemical method) is an effective method for preparing optical antireflection film. Compared with the vacuum method film layer, the sol-gel film layer has the advantages of coating film at room temperature and atmospheric environment, good optical properties and low cost. [0003] The basic scientific principle of ...

Claims

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Application Information

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IPC IPC(8): C03C17/23G02B1/11G02B1/113
Inventor 唐永兴熊怀李海元陈知亚
Owner 杭州光学精密机械研究所
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