Process for texturing crystalline silicon solar cell by dry etching

Abstract

The invention relates to a process for texturing a crystalline silicon solar cell by dry etching, belonging to the technical filed of the solar cell texturing. The process for texturing the crystalline silicon solar cell by dry etching comprises the following steps of pre-processing the surface of a silicon wafer, preparing a layer of nano masking film on the surface of the silicon wafer, carrying out the reactive ion etching (RIE) for the silicon wafer with the nano masking film, removing the residues on the surface of the silicon wafer and texturing the surface of the silicon wafer. After the surface of the silicon wafer is textured, the reflectivity of the surface of the silicon wafer can be reduced to less than 2 percent, and the light absorption rate can be improved. Compared with the traditional technology for texturing the crystalline silicon solar cell by wet chemical etching, the process for texturing the crystalline silicon solar cell by dry etching can ensure that crystalline silicon solar cell has higher photoelectric conversion efficiency and can reduce the environmental pollution caused by texturing the crystalline silicon solar cell and is suitable for the industrial production of the crystalline silicon solar cell.

Description

technical field [0001] The invention belongs to the technical field of solar cell texturing, and in particular relates to a dry etching texturing process for crystalline silicon solar cells. Background technique [0002] With the depletion of traditional energy sources and rising oil prices, as well as the continuous improvement of people's environmental requirements, as a non-polluting clean energy, the development of solar cells is extremely rapid. As a crystalline silicon solar cell that occupies most of the solar cell market today, its preparation technology has always represented the preparation technology level of the entire solar cell industry. For example, improving the conversion efficiency is one of the key topics in solar cell research, and effectively reducing the reflection loss of sunlight on the surface of crystalline silicon wafers is an important method to improve the conversion efficiency of solar cells. [0003] In order to effectively reduce the reflecti...

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Problems solved by technology

[0003] In order to effectively reduce the reflection on the surface of crystalline silicon and improve the light trapping effect, the preparation of textured surface is a very feasible process. At present, the wet method of textured technology is generally used in the industrial production of crystalline silicon solar cells to make the textured surface structure of the battery surface, such as using alkaline solution The surface reflectance of monocrystalline silicon textured surface can be controlled at about 12%; the surface reflectance of polycrystalline textured surface can be controlled at about 21% by using acid solution system. In this case, the surface reflection loss of solar cells is very large. , the external quantum efficiency is low, the size and shape of the suede on the silicon surface are not easy to control, and the use of a large amount of corrosive and toxic chemicals has also brought damage to the environment

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