An optical deflection microscopic surface measurement device and method

Abstract

The invention discloses an optical deflection microscopic surface measurement method. The method comprises: measuring and calibrating the structural position parameter S of the optical deflective microsurface measuring device by using a three-coordinate measuring device; according to the structural position parameter measured and calibrated S, calculating the phase distribution of the deformed fringe optical signal, the deformed fringe optical signal including the microscopic surface profile feature information of the element under test; according to the phase distribution, obtaining the actual spot distribution corresponding to the microscopic surface of the element under test; The actual spot distribution is compared with a preset ideal spot distribution to obtain the microscopic surface profile of the component under test. Correspondingly, the invention also discloses an optical deflection microscopic surface measurement device. The invention realizes the technical scheme of microscopic measurement with high precision, low cost, high spatial resolution and fast measurement speed.

Description

technical field [0001] The invention relates to the field of measurement technology, in particular to an optical deflection microscopic surface measurement device and method. Background technique [0002] In recent years, with the development of micro-nano technology, the demand for the measurement of micro-deformation of components has gradually increased, and the requirements for measurement accuracy and speed have also continued to increase. In the prior art, the microscopic measurement of the reflective surface is usually achieved through technical solutions such as optical interferometer measurement method and scanning microscope measurement method. However, the optical interferometer measurement method has disadvantages such as small measurement dynamic range, susceptibility to environmental interference, and high detection cost. Scanning microscopy measurement methods, such as transmission electron microscopy (STEM), have extremely high horizontal and vertical resolu...

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Problems solved by technology

However, the optical interferometer measurement method has disadvantages such as small measurement dynamic range, susceptibility to environmental interference, and high detection cost.

Scanning microscopy measurement methods, such as transmission electron microscopy (STEM), have extremely high horizontal and vertical resolution, but their measurement range is small and the detection cost is high, so they are subject to many limitations in engineering surface measurement

[0003] The Chinese patent application publication number is CN107560564A, an invention patent of a free-form surface detection method and system. This patent uses a traditional optical deflection measurement device, which uses a projection screen, a component to be tested, and a CCD detector to form a reverse Hartmann optical detection. system, although the system can achieve rapid measurement of the surface of the component, but its spatial resolution is low, and it cannot achieve accurate microscopic measurement

A device for microscopic measurement of optical deflection (see Gerd etc., Microdeflectometry-a novel tool to acquire three-dimensional microtopography with nanometer height resolution, "Optics Letters 33(4), 396-398) realizes the detection of the surface shape error of the reflective surface, through the relationship between the fringe phase and the surface slope To solve the surface shape error, the measurement accuracy is low, and the field of view of the device is small, which limits the measurement range

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