Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Processing method of vertical electrode configuration structure of nanoscale phase change memory unit

A technology of phase-change memory and vertical electrodes, which is applied in the field of microelectronics and can solve problems such as tunneling and shorting

Active Publication Date: 2021-09-14
HUAZHONG UNIV OF SCI & TECH
View PDF2 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] Therefore, it is necessary to propose a processing method for a new electrode configuration structure suitable for nanoscale phase change units to solve the problem of tunneling and shorting in the process of nanoscale low-resistance crystallization

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Processing method of vertical electrode configuration structure of nanoscale phase change memory unit
  • Processing method of vertical electrode configuration structure of nanoscale phase change memory unit
  • Processing method of vertical electrode configuration structure of nanoscale phase change memory unit

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0036] In order to make the object, technical solution and advantages of the present invention more clear, the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, not to limit the present invention. In addition, the technical features involved in the various embodiments of the present invention described below can be combined with each other as long as they do not constitute a conflict with each other. The present invention will be further described in detail below in combination with specific embodiments.

[0037] As a preferred embodiment of the present invention, such as figure 1 As shown, the present invention provides a vertical electrode configuration structure for nanoscale phase change memory cells, wherein: the vertical electrode configuration structure 100 includes an upper electro...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a processing method for a vertical electrode configuration structure of a nanoscale phase-change memory unit, in which a lower electrode material layer, an intermediate phase-change material layer and an upper electrode material layer are sequentially grown according to the procedure; during processing, the upper electrode material is The upper layer and the lower electrode material layer are processed into a partially overlapping upper and lower electrode structure, and the source and drain terminals can be exchanged. For the low-resistance crystal state, by constructing an asymmetric upper and lower electrode structure, compared with the facing vertical electrode structure, the equivalent resistance R is increased, the working current is reduced, the tunneling of large current is avoided, and the device life is prolonged. At the same time, the non-facing area component shunts the series path current, increases the current diffusion in the series process, and also reduces the operating current. The smaller the operating current, the less likely the metastable crystal phase structure will be broken down.

Description

technical field [0001] The invention belongs to the field of microelectronics, and relates to a processing method for a vertical electrode configuration structure of a nanoscale phase-change memory unit, in particular to a design, processing method and a method for a phase-change memory element based on a chalcogenide phase-change material its application. Background technique [0002] The phase change memory based on the chalcogenide phase change material can store information and data through the huge resistance difference between the crystalline phase and the amorphous phase, and can even achieve multi-level phase change storage. This phase-change process has the advantages of low power consumption and high-density cost as the size decreases, so the industry pays great attention to the development of nanoscale phase-change memory. [0003] At present, there are relatively mature applications in the structural design of phase change units, such as T-shaped structure and s...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): H01L45/00B82Y10/00
CPCB82Y10/00H10N70/841H10N70/011
Inventor 童浩马平缪向水
Owner HUAZHONG UNIV OF SCI & TECH
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products