The invention relates to a
voltage stabilizing
diode chip manufacturing method, and belongs to the field of electronic accessories. According to the method for plating
nickel and silver on the
metal, the adhesion among all
layers of the
metal is improved, the
metal is not prone to falling off, and the
weldability and the uniformity are improved. And by adopting a
silicon wafer diffusion method, only one-time photoetching is adopted, so that the cost is greatly reduced. Besides, the glass
powder is adopted for glass
passivation, the glass
powder of the formula is easier and faster to melt after being subjected to high temperature, inconsistent thickness caused by non-uniform melting and cracks of a glass layer are avoided, the uniformity of glass
passivation is improved, PN junctions are better protected while the area of the PN junctions is increased, and the reject ratio of electric leakage is avoided. And the working current is improved. According to the method disclosed by the invention, the mode of grooving the glass of which the grooves are removed by the
ultraviolet laser on the front surface, grooving the back surface by the
infrared laser and then splitting is adopted, so that the loss in the
cutting process and the damage to a glass
passivation layer are greatly reduced, and the product yield and the yield are effectively improved.