Manufacturing process of double-sided process sputtering film capacitive touch sensor

Abstract

The invention discloses a manufacturing process of a double-sided process sputtering film capacitive touch sensor. The manufacturing process comprises a sputtering carrier plate, an ITO sputtering layer, a copper-platinum laminating layer and a capacitor electrode. The process is characterized by further comprising the following steps: step 1, vacuum sputtering; step 2, copper-platinum laminating;step 3, double-sided etching; and step 4, setting of a sensor circuit. According to the invention, the ITO coating is arranged by vacuum sputtering, a copper-platinum metal layer structure is arranged on the ITO plating layer on one side in a rolling and fitting manner, and the copper-platinum layer and the ITO plating layer are etched by adopting a double-sided process etching process. The vacuum sputtering process is low in vacuum degree requirement, and the ITO sputtering layer is uniform, flat, thin, good in light transmission, high in plating layer adhesive force, small in plating layerporosity and high in process yield and process controllability. And the defects in the prior art are overcome.

Description

technical field [0001] The invention relates to the technical field of touch screens, in particular to a manufacturing process of a double-sided process sputtering film capacitive touch sensor. Background technique [0002] The production process of the double-sided process capacitive touch sensor in the prior art adopts evaporation to set the ITO coating, and then evaporates the structure of the metal coating on one side of the ITO coating, and then adopts the double-sided process etching process for the metal coating and the ITO coating. Etching results in uneven thickness of the ITO coating and metal coating, low adhesion of the coating, high vacuum requirements, large porosity of the coating, and low process yield and process controllability. [0003] The present invention adopts vacuum sputtering to set up the ITO coating layer, and then rolls and fits the copper-platinum metal layer structure on one side of the ITO coating layer, and then adopts a double-sided process ...

AI Technical Summary

Problems solved by technology

[0004] The purpose of the present invention is to provide a manufacturing process of a double-sided process sputtering film capacitive touch sensor, which reasonably solves the uneven thickness of the ITO coating and metal coating in the manufacturing process of the prior art double-sided process capacitive touch sensor. Low adhesion, high vacuum requirements, large coating porosity, environmental pollution, low process yield and process controllability

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