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Copper-zirconium-aluminum ternary amorphous alloy thin film and preparation method thereof

An amorphous alloy film, copper zirconium aluminum technology, applied in metal material coating process, ion implantation plating, coating and other directions, can solve the problems of high price and increased cost of zirconium-copper-nickel ternary amorphous alloy film, etc. Achieve the effect of low cost, excellent practical application performance, and accurate control of ingredients

Active Publication Date: 2020-02-28
TONGJI UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Nickel is used as the main component in this patent, and the price of nickel is relatively high, resulting in an increase in the cost of the obtained zirconium-copper-nickel ternary amorphous alloy film

Method used

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  • Copper-zirconium-aluminum ternary amorphous alloy thin film and preparation method thereof
  • Copper-zirconium-aluminum ternary amorphous alloy thin film and preparation method thereof
  • Copper-zirconium-aluminum ternary amorphous alloy thin film and preparation method thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0033] The main components of the copper-based amorphous alloy film in this embodiment are Cu, Zr, and Al, and the percentage (at.%) contents of each element are: Cu 49, Zr 38, and Al 13, respectively.

[0034] Its preparation method is:

[0035] S1: Prepare the target: Melt the raw materials Cu, Zr, and Al elements in proportion to form a single alloy target, the target size is Ф60mm×3mm, and put the prepared alloy target into the sputtering target position;

[0036] S2: Substrate treatment: select monocrystalline silicon (10mm×10mm) as the substrate material, put the monocrystalline silicon into the ultrasonic cleaning equipment for deionized water cleaning for 10 minutes, take it out and clean it with alcohol, and then put it into the ultrasonic cleaning equipment again for cleaning with acetone for 10 minutes , take it out and clean it with deionized water and alcohol, and dry it with warm air after cleaning.

[0037] S3: Carry out magnetron sputtering: first evacuate, so...

Embodiment 2

[0040] The main components of the copper-based amorphous alloy film in this embodiment are Cu, Zr, and Al, and the percentage (at.%) contents of each element are: Cu 49, Zr 38, and Al 13, respectively.

[0041] Its preparation method is:

[0042] S1: Prepare the target: Melt the raw materials Cu, Zr, and Al elements in proportion to form a single alloy target, the target size is Ф60mm×3mm, and put the prepared alloy target into the sputtering target position;

[0043] S2: Substrate treatment: choose 304 stainless steel (10mm×10mm) as the substrate material, put the stainless steel into the ultrasonic cleaning equipment for deionized water to clean for 10 minutes, take it out and clean it with alcohol, then put it into the ultrasonic cleaning equipment again for cleaning with acetone for 10 minutes, after taking it out Clean with deionized water and alcohol, dry with warm air after cleaning, and use stainless steel as the substrate for sputtering.

[0044] S3: Carry out magnet...

Embodiment 3

[0047] The main components of the copper-based amorphous alloy film in this embodiment are Cu, Zr, and Al, and the percentage (at.%) contents of each element are: Cu 51, Zr 38, and Al 11, respectively.

[0048] Its preparation method is:

[0049] S1: Prepare the target: Melt the raw materials Cu, Zr, and Al elements in proportion to form a single alloy target, the target size is Ф60mm×3mm, and put the prepared alloy target into the sputtering target position;

[0050] S2: Substrate treatment: choose 304 stainless steel (10mm×10mm) as the substrate material, put the stainless steel into the ultrasonic cleaning equipment for deionized water to clean for 10 minutes, take it out and clean it with alcohol, then put it into the ultrasonic cleaning equipment again for cleaning with acetone for 10 minutes, after taking it out Clean with deionized water and alcohol, dry with warm air after cleaning, and use stainless steel as the substrate for sputtering.

[0051] S3: Carry out magnet...

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Abstract

The invention relates to a copper-zirconium-aluminum ternary amorphous alloy thin film and a preparation method thereof. The copper-zirconium-aluminum ternary amorphous alloy thin film comprises the following components of, by atomic percentage, 10.0 at.%-23.0 at.% of Al, 33.0 at.%-38.0 at.% of Zr and the balance Cu. The preparation method of the copper-zirconium-aluminum ternary amorphous alloy thin film comprises the following steps that a single alloy target material is prepared; a substrate material is selected, the surface of a substrate is leveled, and then cleaning and blow-drying are carried out on the substrate for later use; and magnetron sputtering preparation is carried out, wherein the vacuum degree value is not lower than 5*10<-4> Pa, the target-substrate distance is 60 mm, and the sputtering time is 30 min. Compared with the prior art, the Cu-based amorphous alloy thin film has the characteristics of good glass forming capability, high hardness, Young modulus, excellentcorrosion resistance and the like, the technological operability of the preparation method of the thin film is high, the manufacturing cost is low, and the preparation method has important applicationand significance for the application and development prospect of the thin film at present.

Description

technical field [0001] The invention belongs to the field of composition design and preparation of amorphous alloy thin films, and in particular relates to a copper-zirconium-aluminum ternary amorphous alloy thin film and a preparation method thereof. Background technique [0002] Due to the atomic structure characteristics of short-range order and long-range disorder, amorphous alloys exhibit many excellent physical, chemical and mechanical properties, and have broad potential application prospects in the industrial field. Compared with large-sized bulk amorphous alloys, amorphous alloy thin films are hardly affected by the critical glass size of the alloy, and large-sized amorphous alloy thin films can be obtained on the substrate material. This amorphous alloy thin film material still exhibits The excellent properties similar to those of bulk amorphous alloys are obtained, so amorphous alloy thin films have broad application prospects. Compared with other amorphous alloy...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/16C23C14/35C22C9/00C22C30/02C22C1/02C22C45/00
CPCC22C1/02C22C9/00C22C30/02C22C45/001C23C14/165C23C14/35
Inventor 魏先顺应承希严彪
Owner TONGJI UNIV
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