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Method for representing anti-irradiation performance of compositionally graded thin film with high throughput

A composition gradient and anti-irradiation technology, which is applied in the direction of material analysis, measuring devices, and analysis materials through electromagnetic means, to achieve the effect of easy operation and improved efficiency

Inactive Publication Date: 2020-02-28
UNIV OF SCI & TECH BEIJING
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, there is no effective way to quickly characterize the relationship between composition and properties, especially the relationship between multi-component alloys and their radiation resistance.

Method used

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Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0017] A method for high-throughput characterization of the radiation resistance of a composition gradient film, comprising the following steps:

[0018] Step 1. Place the prepared composition gradient film in an atomic force microscope for thickness characterization or in a thin film resistance surface scanning device for resistance measurement;

[0019] Step 2. Place the composition gradient film exposed to a certain radiation dose in an atomic force microscope for thickness characterization or in a film resistance surface scanning device for resistance value measurement;

[0020] Step 3. Subtract the thickness value measured in step 2 from the thickness value measured in step 1 to obtain the change in thickness, that is, the degree of radiation swelling, or subtract the resistance value measured in step 2 from the resistance value measured in step 1 to obtain the resistance The change in value is the degree of radiation swelling;

[0021] Step 4, the greater the thickness ...

Embodiment 2

[0025] A method for high-throughput characterization of the radiation resistance of a composition gradient film, comprising the following steps:

[0026] Step 1. Place the prepared composition gradient film in an atomic force microscope for thickness characterization or in a thin film resistance surface scanning device for resistance measurement;

[0027] Step 2. Place the composition gradient film exposed to a certain radiation dose in an atomic force microscope for thickness characterization or in a film resistance surface scanning device for resistance value measurement;

[0028] Step 3. Subtract the thickness value measured in step 2 from the thickness value measured in step 1 to obtain the change in thickness, that is, the degree of radiation swelling, or subtract the resistance value measured in step 2 from the resistance value measured in step 1 to obtain the resistance The change in value is the degree of radiation swelling;

[0029] Step 4, the greater the thickness ...

Embodiment 3

[0033] A method for high-throughput characterization of the radiation resistance of a composition gradient film, comprising the following steps:

[0034] Step 1. Place the prepared composition gradient film in an atomic force microscope for thickness characterization or in a thin film resistance surface scanning device for resistance measurement;

[0035] Step 2. Place the composition gradient film exposed to a certain radiation dose in an atomic force microscope for thickness characterization or in a film resistance surface scanning device for resistance value measurement;

[0036] Step 3. Subtract the thickness value measured in step 2 from the thickness value measured in step 1 to obtain the change in thickness, that is, the degree of radiation swelling, or subtract the resistance value measured in step 2 from the resistance value measured in step 1 to obtain the resistance The change in value is the degree of radiation swelling;

[0037] Step 4, the greater the thickness ...

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PUM

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Abstract

The invention discloses a method for representing anti-irradiation performance of a compositionally graded thin film with a high throughput. The method comprises the following steps of: S1, placing the prepared compositionally graded thin film in an atomic force microscope to carry out representation of a thickness or placing the prepared compositionally graded thin film in thin film resistance surface scanning equipment to carry out measurement of a resistance value; S2, placing the compositionally graded thin film subjected to a certain irradiation dose of exposure in the atomic force microscope to carry out representation of the thickness or placing the compositionally graded thin film in the thin film resistance resistance surface scanning equipment to carry out measurement of the resistance value; S3, subtracting a thickness value measured in the step S1 from a thickness value measured in the step S2 to obtain a change of the thickness, i.e., an irradiation swelling degree, or subtracting a resistance value measured in the step S1 from a resistance value measured in the step S2 to obtain a change of the resistance value, i.e., the irradiation swelling degree; and S4, obtaininga result that the bigger the change of the thickness is or the bigger the change of the resistance value is, the higher the irradiation swelling degree is and the worse the compositional anti-irradiation performance is. The method has the characteristics of simplicity and convenience for operation, high efficiency and rapidness, and is suitable to popularize and apply.

Description

technical field [0001] The invention belongs to the technical field of material genetic engineering, and relates to a high-throughput method for characterizing the anti-irradiation performance of a composition gradient film. Background technique [0002] Under the general background of material genetic engineering-high-throughput screening and design of new materials, the present invention proposes a high-throughput method for characterizing the radiation resistance of composition gradient films. Using techniques such as spray coating, laser cladding, and magnetron sputtering, high-throughput composition gradient films can be prepared. There have been examples of using thin-film resistive surface scanning technology to measure the resistance value of amorphous alloy points. Li Mingxing used thin-film resistive surface scanning Technology to measure the resistance value of each point of Ir-Ni-Ta-(B) series amorphous alloy film. However, there is no effective way to quickly c...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N27/04G01B7/06G01N1/44
CPCG01B7/06G01N1/44G01N27/041
Inventor 张勇周士朝
Owner UNIV OF SCI & TECH BEIJING