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Array substrate, preparation method thereof and display panel

A technology for array substrates and substrates, which is applied in semiconductor/solid-state device manufacturing, electrical components, transistors, etc., and can solve problems affecting the performance of thin-film transistors, etc.

Inactive Publication Date: 2020-05-12
HEFEI BOE DISPLAY TECH CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The present invention at least partially solves the problem that the active layer of the thin film transistor of the existing display panel affects the performance of the thin film transistor due to light, and provides an array substrate that prevents light from reaching the active layer of the transistor

Method used

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  • Array substrate, preparation method thereof and display panel
  • Array substrate, preparation method thereof and display panel
  • Array substrate, preparation method thereof and display panel

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0031] Such as Figure 1 to Figure 4 As shown, this embodiment provides an array substrate, including a substrate 1, a thin film transistor located on the substrate 1, an insulating layer 3, and a barrier 6, the gate layer 2 of the thin film transistor is located on the substrate 1, and the insulating layer 3 Located on the side of the gate layer 2 away from the substrate 1, and the insulating layer 3 covers the gate layer 2, the source drain 5 and the active layer 4 of the thin film transistor are located on the side of the insulating layer 3 away from the substrate 1, and the source At least part of the drain 5 is connected to the active layer 4, and the active layer 4 coincides with the projection of at least part of the gate layer 2 on the substrate 1,

[0032] Wherein, the insulating layer 3 has a through hole 31, the through hole 3 1 with gate layer 2 The projections on the substrate 1 do not overlap, the blocking portion 6 is located in the through hole 31, and the bl...

Embodiment 2

[0055] Such as Figure 1 to Figure 4 As shown, this embodiment provides a method for preparing a base array plate, which is used to form the array substrate in Example 1. The preparation method includes:

[0056] S11 , forming the gate layer 2 of the thin film transistor on the substrate 1 .

[0057] S12 , forming an insulating layer 3 on a side of the gate layer 2 away from the substrate 1 , and the insulating layer 3 has a through hole 31 .

[0058] Specifically, first, a deposition process is used to form an insulating material layer on the side of the gate layer 2 away from the substrate 1 , and then a patterning process (such as a photolithography process, etc.) is used to form the through hole 31 .

[0059] S13. Form the source and drain electrodes 5 and the active layer 4 of the thin film transistor on the side of the insulating layer 3 far away from the substrate 1, and form a blocking portion 6 in the through hole 31 of the insulating layer 3, wherein the blocking po...

Embodiment 3

[0071] This embodiment provides a display panel, including:

[0072] The array substrate in embodiment 1;

[0073] The backlight module is located on the side of the substrate 1 away from the insulating layer 3 .

[0074] Wherein, that is to say, the backlight module is used to provide a light source to the array substrate, so that the pixel units of the array substrate emit light to form a display image.

[0075] However, in the array substrate of this embodiment, the blocking portion 6 is provided in the through hole 31 of the insulating layer 3, which can further prevent the light under the substrate 1 from reaching the source and drain electrodes 5, thereby preventing the light directed to the source and drain electrodes 5 from entering the grid. The reflection between the electrode layer 2 and the source and drain electrodes 5 is reflected onto the active layer 4, thereby further ensuring the electrical performance of the thin film transistor.

[0076] Specifically, the...

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Abstract

The invention provides an array substrate, a preparation method thereof, and a display panel, belongs to the technical field of display, and can at least partially solve the problem that the performance of a thin film transistor is influenced by illumination of an active layer of the thin film transistor of an existing display panel. The array substrate comprises a substrate; a thin film transistor, an insulating layer and a blocking part which are located on the substrate. A gate layer of the thin film transistor is positioned on the substrate; the insulating layer is located on one side of the gate layer away from the substrate; the insulating layer covers the gate layer; source and drain electrodes of the thin film transistor and the active layer are located on one side of the insulating layer away from the substrate; at least part of the source drain electrode is connected with the active layer; projections of the active layer and at least part of the gate layer on the substrate coincide, wherein the insulating layer is provided with a through hole, the projections of the through hole and the gate layer on the substrate are not overlapped, the blocking part is located in the through hole and used for blocking light emitted to the source and the drain from the first direction, and the first direction is the direction in which the substrate is away from the insulating layer and the through hole is away from the gate layer.

Description

technical field [0001] The invention belongs to the field of display technology, and in particular relates to an array substrate, a preparation method thereof, and a display panel. Background technique [0002] A thin film transistor (TFT) is a semiconductor device in a display panel, which plays an important role in the display of the display panel. Specifically, the active layer of the thin film transistor mainly includes traditional amorphous silicon (a-Si), indium gallium zinc oxide (IGZO) and low temperature polysilicon (LTPS) with higher mobility. In order to ensure the performance of the active layer, that is, to ensure the performance of the thin film transistor, it is necessary to prevent light (such as light from a backlight module of a display panel) from being irradiated on the active layer. [0003] Such as figure 1 As shown (the dotted line with the arrow in the figure indicates the light propagation direction), in an existing display panel, the thin film tra...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L27/12H01L29/786H01L21/77
CPCH01L27/1214H01L27/1225H01L27/1259H01L29/78633
Inventor 赵立星朱涛钱海蛟王胜广温海龙刘爽
Owner HEFEI BOE DISPLAY TECH CO LTD