Tungsten titanium powder mixing method

A tungsten-titanium and powder-mixing technology, which is applied in transportation and packaging, vacuum evaporation coating, coating, etc., can solve the problem that the product cannot be shipped and used normally, the cause of mottling is not found, and mottling or spots are easy to appear, etc. problems, achieve high industrial application value, ensure powder mixing efficiency, and reduce mottling effects

Active Publication Date: 2020-06-05
KONFOONG MATERIALS INTERNATIONAL CO LTD
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  • Summary
  • Abstract
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  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] However, in production, it is found that the surface of W-3% Ti target and W-10% Ti target is prone to mottling or spotting, which is unacceptable for high-quality and high-demand semiconductor sputtering targets. With the appearance of spots, the bad scrap rate is as high as 45%, which leads to the failure of normal shipment and use of products, resulting in serious cost wa

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Examples

Experimental program
Comparison scheme
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Example Embodiment

[0059] Example 1

[0060] This embodiment provides a W-3% Ti tungsten-titanium powder mixing method. The method includes the following steps:

[0061] (1) Add 17kg of the first batch of tungsten powder and 3kg of titanium powder into the V-type powder mixer, the mass percentage of titanium powder in the tungsten-titanium mixed powder is 15wt%, and argon gas is introduced for the first powder mixing and mixing. The powder time is 20h, and the speed is 8r / min;

[0062] (2) Add 10kg of the second batch of tungsten powder to the V-type powder mixer to make the mass percentage of titanium powder 10wt%, and carry out the second powder mixing. The powder mixing time is 18h and the speed is 8r / min;

[0063] (3) Add 20kg of the third batch of tungsten powder to the V-type powder mixer, the mass percentage of titanium powder in the tungsten-titanium mixed powder is 6wt%, and the third powder mixing time is 15h and the speed is 8r / min;

[0064] (4) Add 50kg of the fourth batch of tungsten powde...

Example Embodiment

[0066] Example 2

[0067] This embodiment provides a W-1% Ti tungsten-titanium powder mixing method, the method includes the following steps:

[0068] (1) Add 7.3kg of the first batch of tungsten powder and 1kg of titanium powder into the V-type powder mixer. The mass percentage of titanium powder in the tungsten-titanium mixed powder is 12wt%, and argon gas is introduced for the first powder mixing. The mixing time is 12h, and the speed is 10r / min;

[0069] (2) Add 4.2kg of the second batch of tungsten powder to the V-type powder mixer to make the mass percentage of titanium powder 8wt%, and perform the second powder mixing, the mixing time is 24h, and the speed is 6r / min;

[0070] (3) Add 7.5kg of the third batch of tungsten powder to the V-type powder mixer, the mass percentage of titanium powder in the tungsten-titanium mixed powder is 5wt%, and the third powder mixing time is 24h and the speed is 9r / min;

[0071] (4) Add 30kg of the fourth batch of tungsten powder to the V-type ...

Example Embodiment

[0073] Example 3

[0074] This embodiment provides a W-10% Ti tungsten-titanium powder mixing method. The method includes the following steps:

[0075] (1) Put 40kg of the first batch of tungsten powder and 10kg of titanium powder into the V-type powder mixer. The mass percentage of titanium powder in the tungsten-titanium mixed powder is 20wt%, and argon gas is introduced for the first powder mixing and mixing. The powder time is 24h, and the speed is 8r / min;

[0076] (2) Add 16.7kg of the second batch of tungsten powder to the V-type powder mixer so that the mass percentage of titanium powder is 15wt%, and perform the second powder mixing, the powder mixing time is 12h, and the speed is 10r / min;

[0077] (3) Add 16.6kg of the third batch of tungsten powder to the V-type powder mixer, the mass percentage of titanium powder in the tungsten-titanium mixed powder is 12wt%, and the third powder mixing time is 12h, and the speed is 10r / min to obtain uniformly mixed tungsten-titanium mix...

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Abstract

The invention provides a tungsten titanium powder mixing method. According to the method, tungsten powder is put into titanium powder in batches, at least multiple powder mixing processes are performed, and the tungsten powder and the titanium powder are mixed evenly. The method particularly aims at tungsten titanium target materials of W-10%Ti or below, the problem of spots of the tungsten titanium target materials is solved, the percent of pass of tungsten titanium target materials is increased, and the method has the relatively high industrial application value.

Description

technical field [0001] The invention relates to the technical field of target preparation, in particular to a tungsten-titanium powder mixing method. Background technique [0002] With the continuous development of PVD technology, the demand and quality requirements for alloy targets are increasing day by day. The finer the grains of the alloy target, the more uniform the composition structure, and the smaller the surface roughness, the thin film formed on the silicon wafer by PVD more uniform. In addition, the purity of the formed film is also closely related to the purity of the alloy target, so the quality of the film after PVD mainly depends on the purity, density, grain size, microstructure and other factors of the alloy target. [0003] Tungsten-titanium target is a typical alloy target. Large-scale semiconductor integrated circuits, solar cells, etc. will use tungsten-titanium targets for PVD coating to form a barrier layer. For now, the requirements for tungsten-ti...

Claims

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Application Information

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IPC IPC(8): B22F9/04B22F1/00C23C14/34C22C27/04
CPCB22F9/04C23C14/3414C22C27/04B22F1/052
Inventor 姚力军潘杰边逸军王学泽黄东长
Owner KONFOONG MATERIALS INTERNATIONAL CO LTD
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