Device and method for measuring laser wavelength

Abstract

The invention discloses a laser wavelength measurement device and method. The laser wavelength measurement device includes: a first optical path assembly and a second optical path assembly; and the second optical path assembly and the first optical path assembly form a laser wavelength measurement optical path, wherein the second The optical path assembly includes: an FP etalon assembly and an optical classifier, the homogenized laser beam passes through the FP etalon assembly to generate interference fringes; and the optical classifier is arranged behind the FP etalon assembly in the laser wavelength measurement optical path, It is used to deflect the laser beam passing through the FP etalon assembly. The FP etalon assembly of the present invention enables two FP etalons to share the same optical path for interference imaging, has a compact structure, small volume, simple design, and high stability; with the cooperation of an optical classifier, accurate measurement of the laser wavelength can be realized at the same time, The wavelength measurement range is large, suitable for online measurement of laser wavelength and corresponding closed-loop control feedback.

Description

technical field [0001] The invention relates to the technical field of laser spectrum measurement, in particular to a laser wavelength measurement device and method. Background technique [0002] Laser is an important light source equipment in modern industry. It can be used in lighting, laser processing, projection display, optical communication, material analysis, test measurement, semiconductor processing and other fields. ), requiring the laser to have high wavelength stability. Therefore, it is required to design a corresponding laser wavelength measurement device on the laser, and realize closed-loop feedback on the wavelength of the laser according to the measurement results, so as to ensure the stable wavelength output of the laser. [0003] In the field of semiconductor processing technology, the excimer laser is the main light source used in the semiconductor photolithography process. For example, the central wavelength of the ArF excimer laser is 193.4nm, and th...

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Problems solved by technology

[0014] In order to solve the technical problems that the laser wavelength measurement device in the prior art cannot achieve a complete common optical path, the device is relatively complicated, and the wavelength measurement result is easily affected by the outside world, resulting in relatively poor wavelength measurement accuracy and stability, the invention discloses a laser wavelength measurement device. Measuring device and method

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