Application of silicon isotope Si-30 in semiconductor material or semiconductor device capable of resisting medium-high energy neutron radiation
A technology of silicon isotopes and semiconductors, applied in semiconductor devices, semiconductor/solid-state device components, electric solid-state devices, etc., can solve the problems of damaged functions, failures, and degradation of integrated circuits, and achieve improved resistance to medium and high-energy neutron radiation Ability to avoid functional degradation or even failure
- Summary
- Abstract
- Description
- Claims
- Application Information
AI Technical Summary
Problems solved by technology
Method used
Image
Examples
Embodiment
[0018] The average neutron kerma coefficients of silicon isotope Si-30 and natural silicon are calculated, and the average neutron values of silicon isotope Si-30 and natural silicon in the middle-energy neutron and high-energy neutron energy groups are given. The kerma coefficient, as shown in Table 1, can be seen from Table 1 that the neutron irradiation kerma coefficient of the silicon isotope Si-30 is either in the neutron energy group of neutron energy or in the high energy neutron energy group. The lowest, thus indicating that the silicon isotope Si-30 has obvious advantages in resisting medium and high energy neutron irradiation.
[0019] Table 1 Comparison of the average kerma coefficients of silicon isotope Si-30 and natural silicon under medium-high energy neutron radiation
[0020]
[0021] Since the isotope only participates in the nuclear reaction process and does not affect the chemical reaction process, the growth, preparation and semiconductor electrical p...
PUM
Login to View More Abstract
Description
Claims
Application Information
Login to View More - R&D
- Intellectual Property
- Life Sciences
- Materials
- Tech Scout
- Unparalleled Data Quality
- Higher Quality Content
- 60% Fewer Hallucinations
Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.
© 2025 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com

