Workpiece rack and coating system

A workpiece rack and frame technology, applied in the field of workpiece racks and coating systems, can solve the problems of occupied chamber area, limited electric field space, low coating efficiency, etc., and achieves the improvement of coating efficiency, space utilization rate, and coating uniformity. Effect

Active Publication Date: 2020-06-30
龙鳞(深圳)新材料科技有限公司
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Problems solved by technology

[0005] (1) Since the electric field is generated through the different polarities of the electrode plate and the inner wall of the vacuum chamber, the electric field space generated by it in the same chamber is limited, and the plasma generated in the electric field needs to diffuse through a certain distance Only movement can reach the workpiece to be coated, and the coating efficiency is relatively low;
[0006] (2) Because it requires additional devices to achieve coating uniformity, the structure is more complicated, the cost is higher, and it takes up a large part of the chamber area

Method used

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Embodiment Construction

[0036] The present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. It should be understood that the specific embodiments described here are only used to explain the present invention, but not to limit the present invention. In addition, it should be noted that, for the convenience of description, only some structures related to the present invention are shown in the drawings but not all structures.

[0037] In the description of the present invention, unless otherwise clearly specified and limited, the terms "connected", "connected" and "fixed" should be understood in a broad sense, for example, it can be a fixed connection, a detachable connection, or an integrated ; It can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediary, and it can be the internal communication of two components or the interaction relationship between two ...

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Abstract

The invention belongs to the technical field of coating, and specifically discloses a workpiece rack and a coating system. The workpiece rack includes a frame, a front baffle, two side plates, a radio-frequency electrode plate and a grounding electrode plate; the two side plates and the front baffle are enclosed together to form an accommodating cavity with an opening facing away from the front baffle, and through holes on the side plates communicate with the accommodating cavity; each electrode plate is arranged in the accommodating cavity, and is alternately connected to the frame at intervals along the height direction of the frame. The coating system includes a reaction chamber; the workpiece rack is arranged in the reaction chamber; and the workpiece rack is detachably connected to the reaction chamber through a common electrode plate. In the workpiece rack and the coating system provided by the invention, the electric field uniformity is improved; the coating uniformity and coating efficiency can be improved without additional devices; and the coating cost is reduced.

Description

technical field [0001] The invention relates to the field of coating technology, in particular to a workpiece rack and a coating system. Background technique [0002] Vacuum coating is a process method to form a thin film with required characteristics on the surface of metal, plastic and other workpieces in a high vacuum environment. It is widely used in various fields such as electronic equipment manufacturing to improve the physical, Chemical properties, or to obtain a better appearance and aesthetics on the surface of the workpiece. [0003] Plasma Enhanced Chemical Vapor Deposition (PECVD) is a kind of vacuum coating process. According to the relationship between the plasma source in the deposition chamber and the workpiece, it can be divided into direct method and indirect method. Among them, the plate type PECVD structure belongs to the direct method It is more common to place the workpiece on a workpiece holder, and then put the workpiece holder into a reaction chamb...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C16/458C23C16/507C23C16/509
CPCC23C16/4581C23C16/5096C23C16/507
Inventor 邓必龙郑利勇
Owner 龙鳞(深圳)新材料科技有限公司
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