A workpiece rack and coating system

Abstract

The invention belongs to the technical field of coating, and specifically discloses a workpiece rack and a coating system. The workpiece frame includes: a frame, a front baffle, two side plates, a radio frequency electrode plate and a grounding electrode plate. The two side plates and the front baffle are enclosed to form a housing chamber with an opening facing away from the front baffle. The accommodating cavity is connected; each electrode plate is arranged in the accommodating cavity, and is alternately connected to the frame along the height direction of the frame. The coating system includes a reaction chamber, the above-mentioned workpiece rack is arranged in the reaction chamber, and the workpiece rack is detachably connected in the reaction chamber through a common electrode plate. The workpiece rack and the coating system provided by the invention have improved electric field uniformity, can improve coating uniformity and coating efficiency without additional devices, and reduce coating cost.

Description

technical field [0001] The invention relates to the technical field of coating, in particular to a workpiece rack and a coating system. Background technique [0002] Vacuum coating is a process method to form a thin film with required characteristics on the surface of metal, plastic and other workpieces in a high vacuum environment. It is widely used in various fields such as electronic equipment manufacturing to improve the physical, Chemical properties, or make the surface of the workpiece obtain a better appearance. [0003] Plasma Enhanced Chemical Vapor Deposition (PECVD) is a kind of vacuum coating process. According to the relationship between the plasma source of the deposition chamber and the workpiece, it is divided into direct method and indirect method. Among them, the plate PECVD structure belongs to the direct method. It is more common to place the workpiece on a workpiece rack, and then put the workpiece rack into a reaction chamber. There is a flat electrode...

AI Technical Summary

Problems solved by technology

[0005] (1) Since the electric field is generated through the different polarities of the electrode plate and the inner wall of the vacuum chamber, the electric field space generated by it in the same chamber is limited, and the plasma generated in the electric field needs to diffuse through a certain distance Only movement can reach the workpiece to be coated, and the coating efficiency is relatively low;

[0006] (2) Because it requires additional devices to achieve coating uniformity, the structure is more complicated, the cost is higher, and it takes up a large part of the chamber area

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