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Gas leakage detection method for RPS gas dissociation

A detection method and gas technology, which are applied in the field of gas leakage detection of RPS gas dissociation, can solve problems such as poor accuracy, and achieve the effects of reducing the difficulty of detection, improving real-time performance and improving accuracy.

Inactive Publication Date: 2020-07-10
江苏神州半导体科技有限公司
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  • Abstract
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Problems solved by technology

However, this method has the disadvantage of poor accuracy

Method used

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  • Gas leakage detection method for RPS gas dissociation
  • Gas leakage detection method for RPS gas dissociation

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Embodiment Construction

[0024] Embodiments of the present invention are described in detail below, examples of which are shown in the drawings, wherein the same or similar reference numerals designate the same or similar elements or elements having the same or similar functions throughout. The embodiments described below by referring to the figures are exemplary and are intended to explain the present invention and should not be construed as limiting the present invention.

[0025] A gas leakage detection method for RPS gas dissociation according to an embodiment of the present invention will be described below with reference to the accompanying drawings.

[0026] Before describing the gas leakage detection method for RPS gas (remote plasma gas) dissociation of the embodiment of the present invention, it is necessary to introduce the schematic structural diagram of the embodiment of the present invention applied in the specific reaction chamber 1 .

[0027] See attached figure 2 As shown, wherein s...

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Abstract

The invention provides a gas leakage detection method for RPS gas dissociation. The gas leakage detection method comprises the steps: machining a to-be-machined workpiece in a reaction cavity; arranging the reaction cavity in inert gas; introducing oxygen into the reaction cavity, igniting RPS gas, and detecting emission spectrum data of the mixed gas in the reaction cavity; and judging that the reaction cavity leaks gas when the spectrum of the representative gas is greater than the reference value stably for at least multiple times. The method has the capability of monitoring whether the reaction cavity leaks or not in real time when the RPS gas is dissociated, the detection efficiency is greatly improved, the detection difficulty is reduced, the detection real-time performance is good and the safety is effectively improved when the RPS gas is dissociated.

Description

technical field [0001] The invention relates to the technical field of gas leakage detection, in particular to a gas leakage detection method of RPS gas dissociation. Background technique [0002] Plasmas are used in various types of industrial-type processes in the semiconductor and printed wiring board industries, as well as in various other industries such as in the medical device and automotive industries. One common use of plasma is to etch away material in an isolated or controlled environment. Various types of materials can be etched by one or more plasmas, including glass, silicon or other substrate materials, organics such as photoresists, waxes, plastics, rubber, biological agents and plant matter, and metals such as copper, aluminum , titanium, tungsten and gold. Plasmas are also used to deposit materials such as organics and metals onto suitable surfaces by various techniques, such as by chemical vapor deposition, such as sputtering operations, surface modifi...

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01M3/20G01M3/26
CPCG01M3/20G01M3/26
Inventor 徐远波刘锐陈杰
Owner 江苏神州半导体科技有限公司
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