Method for repairing defects of perovskite thin film
A thin film defect and perovskite technology, which is applied in semiconductor devices, electrical components, circuits, etc., can solve the problems of raw material residue, non-dense film, poor stability of perovskite film, etc., to improve stability, improve compactness, The effect of reducing holes
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[0051] Please refer to figure 2 As shown in the photo of the appearance of the perovskite film prepared on the substrate, the method of the present invention is not used for surface repair treatment, and it can be seen that there are obvious hole defects and dust impurity particles on the perovskite film.
[0052] Please refer to figure 1 As shown, the above-mentioned substrate for preparing the perovskite film is repaired using a method for repairing perovskite film defects of the present invention, which specifically includes the following steps:
[0053] Step 1, such as figure 1 As shown in (1), put the prepared large-area perovskite film 101-1 into an anhydrous isopropanol solution 102 and heat it to 40°C for 30 minutes to obtain a clean perovskite film 101-1 .
[0054] Step 2, such as figure 1 As shown in (2), in a dry air environment, place the cleaned perovskite film 101 on a hot stage 103 at a temperature of 100° C. and heat for 10 minutes to obtain a dried perovs...
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