The synthetic method of tetrakis(dimethylamino)titanium

A dimethylamino and synthetic method technology, applied in the field of compound synthesis, can solve problems such as waste of raw materials, yield of dimethylamine, easy escape of dimethylamine, and reduction of dimethylamine, so as to achieve the effect of improving the conversion rate and environmental protection of the process
CN111592565BActive Publication Date: 2020-11-20苏州欣溪源新材料科技有限公司
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Patent Information

Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
苏州欣溪源新材料科技有限公司
Publication Date
2020-11-20

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Abstract

The invention relates to a synthesis method of tetrakis(dimethylamino)titanium. The synthesis method comprises the following steps: mixing an alkane solvent and an organometallic lithium compound to prepare a first reactant; deriving dimethylamine gas at a gas outflow pressure of 0.12-0.15 MPa, and dissolving the dimethylamine gas at -10-20 Condensation at a temperature of °C, adding the formed dimethylamine condensate to the first reactant for the first reaction to prepare the second reactant; adding titanium tetrachloride to the second reactant for the second reaction , preparing the tetrakis(dimethylamino)titanium after post-treatment. The synthesis method can avoid the above-mentioned hidden dangers of explosion and risk factors, and may greatly reduce the generation of solid waste and liquid waste, which is safe and environmentally friendly. At the same time, the yield of tetrakis(dimethylamino)titanium is high, and the process is easy to operate.
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Description

Technical field

[0001] The invention relates to the technical field of compound synthesis, in particular to a synthesis method of tetra (dimethylamino) titanium. technical background

[0002] With the continuous development of semiconductor manufacturing, ALD (atomic layer deposition) technology has become one of the most ideal deposition methods for semiconductor manufacturing because of its simple operation, highly controllable deposition parameters and excellent deposition uniformity. It is very important to find precursors of high-k and metal gate materials suitable for ALD, and to improve the purity of materials. Tetra (dimethylamino) titanium, molecular formula c 8 H 24 N 4 Ti, a compound that is very sensitive to air and water vapor, can be dissolved in organic solvents such as alcohols, benzene and carbon tetrachloride. Tetra (dimethylamino) titanium not only has good stability, high vapor pressure, but also shows high reactivity, which is a hot material in the research f...

Claims

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